Sk Innovation Co., Ltd.

Lg Energy Solution, Ltd.

Sk-Materials Co., Ltd.

Sk Corporation

Other

Lg Chem, Ltd

Sk Ie Technology Co., Ltd.

Cheol Woo Kim

Kwang Kuk Lee

Jin Kyung Jo

Young Bom Kim

Sang Hoon Choy

Jae Hoon Kwak

Taek Soo Lee

Yu Na Shim

Jong Ho Lee

Jin Sung Kim

Ki Tae Kim

Young Joon Jo

Seong Il Lee

Min Kyung Seon

Sung Yon Oh

Jin Young Son

Ji Hee Yoon

Je Ho Lee

Seung Yon Oh

Jung Ha Shin

Jin Su Ham

Jeong Min Choi

Byoung Hoon Ahn

So Young Lee

Dai In Park

Kyoung Ha Lee

Hyo Seung Park

Hyun Sik Chae

Sin Woo Kim

Jung Min Yang

Whee Sung Kim

Do Hyun Lee

Jin Kyung Park

Kyu Seok Han

Chan Soo Jun

Moo Yong Shin

An optical multilayer structure including a hard coating layer, a low-reflective adhesion reinforcement layer, and a water repellent layer on a substrate layer. The optical multilayer structure includes a structure in which a hard coating layer, a low-reflective adhesion reinforcement layer including a siloxane-based compound, and a water repellent layer including an alkoxysilane-based compound containing a fluorine atom are laminated on a substrate layer, thereby having high wear resistance and water contact angle simultaneously.

Optical multilayer structure, method of manufacturing the same and window cover film comprising the same

The present invention relates to electrode slurry coating apparatus and method, the present invention ultimately allowing the process efficiency to be increased and rate of errors to be reduced when double-layer structured active material layers are formed by temporally adjusting the height of first and second discharge outlets through which active material is discharged.

Electrode slurry coating apparatus and method for forming double active material layers

An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an organic phosphate represented by Formula 1 below:

Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices

An etching composition contains phosphoric acid, phosphoric anhydride, a compound represented by the following Formula 1, and a silane compound comprising at least one silicon (Si) atom, excluding the compound represented by Formula 1: wherein, in Formula 1, A is an n-valent radical, where n is an integer of 1 to 6, L is a direct bond or hydrocarbylene, Y is selected from NR, O, PRand S, where Rto Rare independently hydrogen, halogen, a substituted or unsubstituted hydrocarbyl group, or non-hydrocarbyl group, X and Z are independently selected from N, O, P and S, and Rto Rare independently an unshared electron pair, hydrogen, or a substituted or unsubstituted hydrocarbyl group.

Composition for etching, method for etching insulator and method for manufacturing semiconductor device, and novel compounds

The present invention relates to an electrode slurry coating device and method, wherein the heights of first and second slot die heads for discharging active material can be controlled according to time to improve process efficiency and reduce defect rates when forming an active material layer having a double layer structure.

Secondary battery electrode plate including electrode mixture regions having different binder content, and method for manufacturing secondary battery electrode using same

Disclosed is a radial tire having a cap ply manufactured with a polyethylene terephthalate dip cord. The radial tire includes: a pair of parallel bead cores; at least one radial carcass ply wound around the bead cores; one or more inclined belt layers layered on the outer circumference of the carcass ply; and one or more cap ply layers layered in the circumferential direction of a tire on the outer circumference of the inclined belt layers, wherein the cap ply includes a dip cord manufactured using a yarn comprising 90 mol % or more of polyethylene terephthalate, and the dip cord has a shrinkage of 3.0-4.0%, a strength of 2.5-3.0 g/d at an elongation of 5%, a breaking strength of 6.5-7.5 g/d, and a dimensional stability index of 5.8-6.5.

Polyester tire cord and radial tire using same

The present invention relates to a double slit coating die, and an electrode active material coating apparatus comprising same, the double slit coating die comprising first to fourth blocks which are positioned sequentially adjacent to each other, and having a structure in which the positions of the first and second blocks can move in a direction tilted at an angle &#x3b8; with respect to the interface between the second and third blocks. The present invention has the effects of preventing slip surfaces between blocks constituting the die from spreading apart, and reducing offset in a coating process.

Coating die including double slit, and electrode active material coating apparatus using same

The present invention relates to an apparatus and method for monitoring a dry state of an electrode substrate in which electrode slurry is applied to a collector. The monitoring method comprises emitting light onto a surface of the electrode substrate; receiving the light reflected by the surface of the electrode substrate; and analyzing a luminous intensity or spectrum of the received light to estimate a drying rate of the electrode substrate. The apparatus includes a light emitting part emitting light from a light source onto a surface of the electrode substrate; a light receiving part receiving the light reflected by the surface of the electrode substrate; and a computing device analyzing a luminous intensity or spectrum of the received light and comparing analyzed characteristics of the light with the reference data of the reflected light to the drying rate of the electrode substrate.

Method for monitoring dry state of electrode substrate

A method for manufacturing an electrode having an irregular shape through a simple process while minimizing the amount of wasted electrode active material is provided. The method results in first to third coating areas formed to be spaced apart from each other on a collector, a plurality of fourth coating areas formed between the first coating area and the second coating area, and a plurality of fifth coating areas formed between the second coating area and the third coating area. The plurality of fourth coating areas and the plurality of fifth coating areas are dislocated from each other when viewed from one side in a width direction of the collector.

Method for manufacturing electrode

An etchant composition includes a silane compound represented by the following Chemical Formula 1: 

Silane compound

A method of preparing graphene, including preparing graphite; and putting the graphite in the inside of a vessel and applying vibration at a frequency of 55 Hz to 65 Hz to the vessel.

Method of preparing graphene

The present disclosure relates to a silicon compound represented by Formula 1 below: 

Silicon compound

An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an ammonium salt represented by Formula 1 below: 

An etching composition contains phosphoric acid, phosphoric anhydride, a compound represented by the following Formula 1, and a silane compound comprising at least one silicon (Si) atom, excluding the compound represented by Formula 1: 

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Daejeon, South Korea

Cheol Woo Kim