Asml Netherlands B.v.

Chenji Zhang

Jen-Shiang Wang

Yongfa Fan

Ya Luo

Leiwu Zheng

Yi-Yin Chen

Ziyang Ma

Xin Guo

A method for training a patterning process model, the patterning process model configured to predict a pattern that will be formed by a patterning process. The method involves obtaining an image data associated with a desired pattern, a measured pattern of the substrate, a first model including a first set of parameters, and a machine learning model including a second set of parameters; and iteratively determining values of the first set of parameters and the second set of parameters to train the patterning process model. An iteration involves executing, using the image data, the first model and the machine learning model to cooperatively predict a printed pattern of the substrate; and modifying the values of the first set of parameters and the second set of parameters such that a difference between the measured pattern and the predicted pattern is reduced.

Method for training or using a process model for determining a pattern in a patterning process

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San Jose, CA, United States of America

Chenji Zhang