Alliedsignal Inc.

Corning Incorporated

Hoechst Celanese Corporation

Other

Chengjiu Wu

James T Yardley

Michael J McFarland

Jianhui Shan

Ajay Nahata

Anne M Mooring

Keith A Horn

Baopei Xu

Karl Wayne Beeson

Lawrence W Shacklette

Louay A Eldada

Christopher E Osuch

Chengzeng Xu

Kelly M T Stengel

This invention relates to a novel class of halofluorinated acrylates and more particularly to chlorofluorinated or bromofluorinated acrylates characterized by a chlorofluorinated or bromofluorinated alkylene moiety with acrylate functions at both terminals. These chlorofluorinated acrylates may be photocured in the presence of a photoinitiator into transparent polymers useful as optical waveguiding materials.

Photocurable halofluorinated acrylates

The invention provides organic optical waveguide devices which are lithographically formed and employ polymeric materials having low optical loss, good long term and short term stability, good flexibility and reduced stress or crack induced scattering loss. An optical element has a substrate; a patterned, light transmissive core composition on the surface of the substrate; and a light reflecting cladding composition on the pattern of the core. The core composition has a glass transition temperature of about 80&deg; C. or less and the cladding composition has a glass transition temperature of about 60&deg; C. or less.

High performance acrylate materials for optical interconnects

Method for making unsymmetrically substituted fluorenyl compounds for nonlinear optical applications

Halofluorinated alkylene monomers are made by a method comprising the steps of: (a) subjecting a first polymer which is the reaction product of a fluorinated vinyl monomer and a vinyl comonomer to dehydrohalogenation to form a second polymer; (b) treating the second polymer with an oxidizing agent to form an oxidation product consisting of a .alpha., .omega.-dicarboxylic acid or an ester derivative thereof; and (c) treating said oxidation product with a reducing agent to form a reduction product consisting of a a .alpha., .omega.-diol. Preferably, the first polymer has a structure of --[CH.sub.2 CYZ(CF.sub.2 CFX).sub.n ].sub.m -- wherein X and Y=F, Cl or Br; X and Y may be the same or different; Z=H, F, Cl, Br, alkyl or perfluoroalkyl containing from about 1 to about 10 carbon atoms; n=an integer larger than about 1; and m is an integer between about 2 and about 10.sup.5. The .alpha., .omega.-dicarboxylic acids and .alpha., .omega.-diols produced herein can be directly used as polycondensation monomers. Alternatively, the .alpha., .omega.-dicarboxylic acids and .alpha., .omega.-diols can be further derivitized to tri-, tetra- or other multifunctional alcohols which may be directly used as condensation monomers or they may be converted to acrylates which may be photocured in the presence of a radical photoinitiator into transparent polymers which are useful as optical waveguiding materials.

Method for making photocurable halofluorinated acrylates

A photopolymerizable composition for use in forming a photopolymer composition for use in forming the light transmissive regions of light transmissive devices, and such devices. The photopolymerizable composition comprises one or more ethylenically unsaturated monomers selected from the group consisting of aryl acrylates and aryl methacrylates and preferably multi-functional aryl acrylates and aryl methacrylates such as aryl triacrylates, aryl diacylates, and aryl tetraacrylates; and a photoinitiator that activates polymerization of the unsaturated monomers upon exposure to actinic radiation. The composition may be polymerized to form a photopolymer which on exposure to a temperature of 190.degree. C. in air for 24 hours exhibits a coloration on the Gardner Color Scale equal to or less than 8 as determined by ASTM D1544-80 and which exhibits no cracking or delamination from a glass substrate as defined by ASTM D4538-90A on exposure of the same to a temperature of 190.degree. C. for 24 hours in air.

Thermally-stable photopolymer composition and light transmissive device

This invention relates to polymers having non-linear optical properties which polymers include fluorene moieties having at least one electron accepting group and at least one electon donating group substituted to different phenyl rings of the fluorene moiety.

Polymers exhibiting nonlinear optical properties

Optically active (optically non-linear or electro-optically active) waveguides are formed by depositing a layer of organic material, typically polymeric material, comprising one or more opticaly active components, and subjecting predetermined regions of the layer to actinic radiation to alter the refractive index of these regions.

Method for forming optically active waveguides

Photoinitiators having a terminal fluoroalkyl moiety are useful for photopolymerizing and photocuring fluorinated as well as non-fluorinated monomers, especially fluorinated acrylic monomers.

Fluorinated photoinitiators and their application in UV curing of

Compounds having non-linear optical activity of the general formula ##STR1## wherein D and A are electron donor and acceptor groups, respectively, R.sup.1 and R.sup.2 are aromatic bridging groups, X and Y are preferably groups capable of partaking in polymerization reactions are suitable for use in polymer-based light modulator devices.

Unsymmetrically substituted fluorenes for non-linear optical applications

Photoinitiators having at least one terminal fluoroalkyl moiety are useful for photopolymerizing and photocuring fluorinated as well as non-fluorinated monomers, especially fluorinated acrylic monomers.

Azo-type optically active compounds and polymers are provided based on compounds of the general structure

Electro-optical materials and light modulator devices containing same

Photosensitizers containing saturated and unsaturated polycyclic compounds containing the cyclopentane-2-diazo-1,3-dione structural unit. These compounds have their maximum u.v. absorption at around 248 nm, decompose into polar products upon irradiation, and can be used as photosensitizers in positive deep u.v. or excimer laser (248 nm) lithography. They are most preferably useful with deep u.v. transparent resins for forming photoresists.

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Morristown, NJ, United States of America

Chengjiu Wu