Macronix International Co., Ltd.

Transwell Biotech Co., Ltd.

Taiwan Semiconductor Manufacturing Comp. Ltd.

Cheng-Yi Lin

Mao-I Ting

Kuo-Shu Tseng

Ta-Hung Yang

Chih-Ping Chen

Yao-Yuan Shang

You-Feng Chen

Hsin-Cheng Liu

Shao-Chung Hsu

Yih-Cheng Shih

Jia-Hau Tzeng

Chung-Te Tsai

Yuh-Tong Tsay

Ting-Yu Huang

Ya-Hsuan Chang

Chih-Hsien Hung

Kun-Chi Chiang

Chih-Yuan Chao

Bin-Ru She

Jung-Kuei Lu

De-Chuan Liu

The present disclosure provides for a cell stabilizing medium which comprises gelatin. The cell stabilizing medium help maintain cell viability, e.g., after thawing of a biological material post-cryopreservation.

Compositions and methods for maintaining cell viability

The present disclosure provides for a cryopreservation composition comprising a permeating cryoprotectant, a saccharide and a macromolecule. The cryopreservation composition has a low toxicity to cells and tissues, and promotes survival and retention of viability of the biological material during cryopreservation.

Composition, kit and method for cryopreserving cells

A cup-wash device is provided. The cup-wash device includes a supporting disk and a base disposed on the supporting disk. The base includes a catchment groove, a first dispensing opening formed on an edge of the base, and a first channel connected with the catchment groove and the first dispensing opening. The cup-wash device also includes a cover disposed on the base and covering the first channel, and the cover has an injection opening connected to the catchment groove.

Cup-wash device, semiconductor apparatus, and cup cleaning method

The current invention provides a method for analyzing process variations that occur during integrated circuit fabrication. Critical dimension data is collected for each layer of the integrated circuit fabrication process for a period of time and a shift indicator that indicates variation in the critical dimension data for each layer of the integrated circuit fabrication process is calculated. A machine drift significance indicator is also calculated for each machine used in each layer of the integrated circuit fabrication process, and a maximum shift of mean value for each layer of the integrated circuit fabrication process is defined. The shift indicator, the maximum shift of mean value and the machine drift significance indicator are used to determine at least one likely cause of variation in critical dimension for each layer of the integrated circuit fabrication process.

Critical dimension statistical process control in semiconductor fabrication

A bubble detection system to detect bubbles in photoresist. The system includes photoresist at least one tank, a buffer tank, a pump, and a bubble sensor. The photoresist tank provides the photoresist. The buffer tank stores the photoresist from the photoresist tank. The pump pumps the photoresist from the buffer tank to an end terminal. The bubble sensor is set between the buffer tank and the pump to detect bubbles in the photoresist, and outputs an alarm signal when bubbles are detected. The nozzle is set at the end terminal to output the photoresist.

Bubble detection system for detecting bubbles in photoresist tube

Growing community of inventors

Hsinchu, Taiwan

Cheng-Yi Lin