Taiwan Semiconductor Manufacturing Comp. Ltd.

Realtek Semiconductor Inc.

Promise Technology, Inc.

Silicon Integrated Systems Corporation

Cheng-Yi Huang

Chih-Shen Yang

Shou-Wen Kuo

Yi-Lin Li

Wei-Ting Wang

Bao-Chi Peng

Chao-Li Shih

Ching-Hou Su

Chih-Pin Wang

Yi-Zhen Chen

Fang-Chi Chien

Tsung-Jen Yang

Yen-Ji Chen

Po-Wen Chai

Yi-Shiung Chen

Chia-Hung Chu

Fu-Jen Li

Tsung-Min Lin

Po-Sheng Lu

Chin-Shen Hsieh

Hung-Ming Chien

Yue-Lin Peng

Chien-Hsiang Chen

Chao-Po Lu

Chun-Ta Chen

Kai-Wen Wu

Ming-Hsuan Chuang

Hsu-Shui Liu

Kuang-Yu Yen

Tsung-Chieh Tsai

Su-Yu Yeh

Hou-Wei Lin

Sheng-Tai Peng

Hsing-Jui Lee

Che-Jen Wang

Kuo-Hung Liao

Yu-Hsiang Lin

Chao-Jie Tsai

Wei-Da Chen

Hsing-Hsiang Wang

Lu-Chang Chen

Yen-Chen Liu

Yu-Feng Han

Cheng-Hao Yu

Wen-Feng Hsu

Kuo-Heng Lo

Shyan-Ming Yuan

Ying-Tse Kuo

Kun-Tien Hsu

Fu-Zen Lin

Yung-Wen Huang

Yi-Feng Chiang

Chi-Bing Chen

P Y Chiu

Miau-Shing Tsai

Tom Peng

Chen-shih Chung

Ching-Horng Chen

A gas tube, a gas supply system containing the same and a semiconductor manufacturing method using the same are provided. The gas tube includes a porous material body and a resistant sheath surrounding the porous material body. The porous material body has a hollow tube structure and an empty cavity inside the hollow tube structure. The porous material body is hydrophobic and has a plurality of pores therein. The resistant sheath is disposed on the porous material body and surrounds the porous material body. The resistant sheath includes a plurality of holes penetrating through the resistant sheath.

Gas tube, gas supply system and manufacturing method of semiconductor device using the same

A Faraday shield, a semiconductor processing apparatus, and an etching apparatus are provided. The Faraday shield includes a plurality of conductive slices and a spacer interposed between adjacent two of the conductive slices to electrically isolate the adjacent two of conductive slices from one another. The conductive slices are separately arranged aside one another and oriented along a circumference of the Faraday shield. A coil is wound around the circumference of the Faraday shield.

Semiconductor processing apparatus for generating plasma

A multi-spray RRC process with dynamic control to improve final yield and further reduce resist cost is disclosed. In one embodiment, a method, includes: dispensing a first layer of solvent on a semiconductor substrate while spinning at a first speed for a first time period; dispensing the solvent on the semiconductor substrate while spinning at a second speed for a second time period so as to transform the first layer to a second layer of the solvent; dispensing the solvent on the semiconductor substrate while spinning at a third speed for a third time period so as to transform the second layer to a third layer of the solvent; dispensing the solvent on the semiconductor substrate while spinning at a fourth speed for a fourth time period so as to transform the third layer to a fourth layer of the solvent; and dispensing a first layer of photoresist on the fourth layer of the solvent while spinning at a fifth speed for a fifth period of time.

Method and apparatus for multi-spray RRC process with dynamic control

In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

Permeance magnetic assembly

In an embodiment, an apparatus comprising: a heater configured to heat a wafer located on a wafer staging area of the heater, the heater comprising a heater shaft extending below the wafer staging area; and a heater lift assembly comprising: a lift shaft configured to move the heater shaft in a vertical direction; a clamp that connects the heater shaft to the lift shaft; and a damper disposed on top of the clamp.

Heater lift assembly spring damper

The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Space filling device for wet bench

A method and apparatus for dosage measurement and monitoring in an ion implantation system is disclosed. In one embodiment, a transferring system, includes: a vacuum chamber, wherein the vacuum chamber is coupled to a processing chamber; a shaft coupled to a ball screw, wherein the ball screw and the shaft are configured in the vacuum chamber; and a vacuum rotary feedthrough, wherein the vacuum rotary feedthrough comprises a magnetic fluid seal so as to provide a high vacuum sealing, and wherein the vacuum rotary feedthrough is configured through a first end of the vacuum chamber and coupled to the ball screw so as to provide a rotary motion on the ball screw.

Method and apparatus for reducing vacuum loss in an ion implantation system

In an embodiment, a method includes: receiving, within a processing chamber, a wafer with a photoresist mask above a metal layer, wherein the processing chamber is connected to a gas source; applying an etchant configured to etch the metal layer in accordance with the photoresist mask within the processing chamber; and applying gas from the gas source to perform plasma ashing in the processing chamber.

Metal etching with in situ plasma ashing

The present invention discloses a noise reduction touch light adjustment device including a light adjustment film, a capacitive touch panel, a noise reduction film, a glass substrate, a control circuit module, and an alternating current (AC) transformer. The noise reduction film is disposed between the light adjustment film and the capacitive touch panel to lower noise inputted from the AC transformer into the light adjustment film such that the capacitive touch panel is ensured to be operated precisely.

Noise reduction touch light adjustment device and noise reduction method thereof

Growing community of inventors

Hsinchu, Taiwan

Cheng-Yi Huang