Taiwan Semiconductor Manufacturing Comp. Ltd.

Cheng-Ming Lin

Hao-Ming Chang

Ziwei Fang

Sai-Hooi Yeong

Chi On Chui

Huang-Lin Chao

Chih-Ming Chen

Sheng-Chang Hsu

Chung-Yang Huang

Peng-Soon Lim

Zi-Wei Fang

Shao-Chi Wei

Wei-Yen Woon

Yu-Hsin Hsu

Kuan-Shien Lee

Wang Cheng Shih

Han-Yu Lin

Cheng-Hsuen Chiang

Chih-Chiang Tu

Mrunal Abhijith Khaderbad

Chi-Ta Lu

Ching-Yueh Chen

Wei-Chung Hu

Tsun-Cheng Tang

Szu-Hua Chen

Chun-Chieh Tien

Ting-Chang Hsu

Yu-Tung Chen

Yen-Wei Huang

Kuo-Chin Lin

Bo-Feng Young

Chih-Yu Chang

Szuya Liao

Kai Tak Lam

Yi-Hsuan Lin

Min-An Yang

Ming Che Li

Po-Cheng Lai

Wei-Hsin Lin

Hsao Shih

Li-Chih Lu

Tai-Chun Huang

Chien-Chao Huang

Chi-On Chui

Tzer-Min Shen

Chai-Wei Chang

Ming-Chang Wen

Chia-Wei Chang

Ming-Jie Huang

Ting-Gang Chen

Jong-Yuh Chang

Yuan-Chih Chu

Chue San Yoo

Sai-hooi Yeong

Jhih-Rong Huang

Kenichi Sano

Chien-Hung Lai

Boming Hsu

Hsuan-Wen Wang

Waylen Chang

Huai-Chih Cheng

Hsin-Yi Yin

S C Hsu

Kuo Chin Lin

Joy Huang

Jen-His Chiu

Way-Len Chang

A semiconductor structure includes gate spacers disposed over a semiconductor layer, a hafnium-containing dielectric layer, where a first portion of the hafnium-containing dielectric layer having a first thickness is disposed over the semiconductor layer and a second portion of the hafnium-containing dielectric layer having a second thickness is disposed along sidewalls of the gate spacers, and where the first thickness is greater than the second thickness, and a metal gate electrode disposed over the hafnium-containing dielectric layer and between the gate spacers.

Fabrication of field effect transistors with ferroelectric materials

In a method of manufacturing a photo mask, a resist layer is formed over a mask blank, which includes a mask substrate, a phase shift layer disposed on the mask substrate and a light blocking layer disposed on the phase shift layer. A resist pattern is formed by using a lithographic operation. The light blocking layer is patterned by using the resist pattern as an etching mask. The phase shift layer is patterned by using the patterned light blocking layer as an etching mask. A border region of the mask substrate is covered with an etching hard cover, while a pattern region of the mask substrate is opened. The patterned light blocking layer in the pattern region is patterned through the opening of the etching hard cover. A photo-etching operation is performed on the pattern region to remove residues of the light blocking layer.

Method of manufacturing phase shift photo masks

A semiconductor device having a low-k isolation structure and a method for forming the same are provided. The semiconductor device includes channel structures, laterally extending on a substrate; gate structures, intersecting and covering the channel structures; and a channel isolation structure, laterally penetrating through at least one of the channel structures, and extending between separate sections of one of the gate structures along an extending direction of the one of the gate structures. A low-k dielectric material in the channel isolation structure comprises boron nitride.

Semiconductor device having isolation structure formed of low-k dielectric material and method for forming the same

The present disclosure describes a semiconductor device and a method for forming the semiconductor device. The method includes forming a fin structure on a substrate, forming a gate structure on the fin structure, and forming a source/drain (S/D) region on the fin structure not covered by the gate structure. The method further includes forming a contact structure on the S/D region. Forming the contact structure includes forming a transition metal chalcogenide (TMC) layer on the S/D region, and forming a contact plug on the TMC layer.

Contact structures in semiconductor devices

A method includes forming a semiconductor fin; forming a gate dielectric layer over the semiconductor fin; depositing a first work function metal layer over the gate dielectric layer, the first work function metal layer having a first concentration of a work function material; depositing a second work function metal layer over the first work function metal layer, the second work function metal layer having a second concentration of the work function material, wherein the first concentration is higher than the second concentration; and forming a gate electrode over the second work function metal layer.

FinFET having a work function material gradient

A method for cleaning is provided. The method includes: removing a pellicle frame from a top surface of a photomask by debonding an adhesive between the photomask and the pellicle frame, wherein a first portion of the adhesive is remained on the top surface of the photomask, and removing the first portion of the adhesive on the top surface of the photomask, including applying an alkaline solution to the top surface of the photomask, and performing a mechanical impact to the photomask.

Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask

The present disclosure relates to a semiconductor device including a substrate and first and second spacers on the substrate. The semiconductor device also includes a gate stack between the first and second spacers. The gate stack includes a gate dielectric layer having a first portion formed on the substrate and a second portion formed on the first and second spacers; an internal gate formed on the first and second portions of the gate dielectric layer; a ferroelectric dielectric layer formed on the internal gate and in contact with the gate dielectric layer; and a gate electrode on the ferroelectric dielectric layer.

Selective internal gate structure for ferroelectric semiconductor devices

A method includes: inspecting a reticle in a reticle pod, the reticle pod including a sealed space to accommodate the reticle, and the reticle pod further comprising a window arranged on an upper surface of the reticle pod, wherein the inspecting is performed through the window; and moving the reticle out of the reticle pod for performing a lithography operation using the reticle.

Structure and method of reticle pod having inspection window

The present disclosure provides a method that includes providing a semiconductor structure having a bottom channel region and a top channel region over the bottom channel region; forming a gate dielectric layer over and wrapping around top channels in the top channel region; performing a radical treatment on the dielectric layer in a supercritical fluid; and forming a metal gate electrode on the dielectric layer.

Radical treatment in supercritical fluid for gate dielectric quality improvement to CFET structure

The present disclosure provides low resistance contacts and damascene interconnects with one or more graphene layers in fin structures of FETs. An example semiconductor device can include a substrate with a fin structure that includes an epitaxial region. The semiconductor device can also include an etch stop layer on the epitaxial region, and an interlayer dielectric layer on the etch stop layer. The semiconductor device can further include a metal contact, above the epitaxial region, formed through the etch stop layer and the interlayer dielectric layer, and a graphene film at interfaces between the metal contact and each of the epitaxial region, the etch stop layer, and the interlayer dielectric layer.

Graphene layer for low resistance contacts and damascene interconnects

A semiconductor device includes a semiconductor feature, a low-k dielectric feature that is formed on the semiconductor feature, and a Si-containing layer that contains elements of silicon and that covers over the low-k dielectric feature. The Si-containing layer can prevent the low-k dielectric feature from being damaged in etch and/or annealing processes for manufacturing the semiconductor device.

Semiconductor device, and method for protecting low-k dielectric feature of semiconductor device

A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

Mask defect prevention

A device includes a semiconductor channel region and a gate structure. The semiconductor channel region is on a substrate. The gate structure is over the semiconductor channel region and comprises a gate dielectric layer, a first gate conductor layer, and a second gate conductor layer. The first gate conductor layer is over the gate dielectric layer. The first gate conductor layer includes oxygen. The second gate conductor layer is over the first gate conductor layer.

Semiconductor device and fabrication method thereof

A method for forming a semiconductor device includes receiving a substrate having a first opening and a second opening formed thereon, wherein the first opening has a first width, and the second opening has a second width less than the first width; forming a protecting layer to cover the first opening and expose the second opening; performing a wet etching to widen the second opening with an etchant, wherein the second opening has a third width after the performing of the wet etching, and the third width of the second opening is substantially equal to the first width of the first opening; and performing a photolithography to transfer the first opening and the second opening to a target layer.

Method for forming semiconductor device

A circuit layout patterning method includes: receiving a photomask substrate including a shielding layer; defining a chip region and a peripheral region adjacent to the chip region; forming a design pattern in the chip region; forming a reference pattern by emitting one first radiation shot and a beta pattern by emitting a plurality of second radiation shots in the peripheral region, wherein a pixel size of the first radiation shot is greater than a pixel size of the second radiation shot; comparing a width of the reference pattern and a width of the beta pattern; transferring the design pattern to the shielding layer if a difference between the width of the reference patterned and the width of the beta pattern is within a tolerance; and transferring the design pattern of the photomask to a semiconductor substrate.

Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the same

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Yunlin County, Taiwan

Cheng-Ming Lin