Taiwan Semiconductor Manufacturing Comp. Ltd.

National Cheng-kung University

Cheng-Che Chung

Ching-Sen Kuo

Tsai-Ming Huang

Sheng-Chau Chen

Hsun-Chung Kuang

Feng-Jia Shiu

Chin-Wei Liang

Yen-Chang Chu

Jieh-Jang Chen

Hsien-Chang Chang

I-Fang Cheng

Wei-Chieh Huang

Yi Jen Tsai

Wen-Horng Yang

In a method of manufacturing a semiconductor device, a first interlayer dielectric (ILD) layer is formed over a substrate, a chemical mechanical polishing (CMP) stop layer is formed over the first ILD layer, a trench is formed by patterning the CMP stop layer and the first ILD layer, a metal layer is formed over the CMP stop layer and in the trench, a sacrificial layer is formed over the metal layer, a CMP operation is performed on the sacrificial layer and the metal layer to remove a portion of the metal layer over the CMP stop layer, and a remaining portion of the sacrificial layer over the trench is removed.

Semiconductor device and methods of manufacturing thereof

In a method of manufacturing a semiconductor device, a first layer having an opening is formed over a substrate. A second layer is formed over the first layer and the substrate. A photo resist pattern is formed over the second layer above the opening of the first layer. The photo resist pattern is reflowed by a thermal process. An etch-back operation is performed to planarize the second layer.

Method for manufacturing a semiconductor device

A method of antibiotic susceptibility testing is disclosed, and includes the following steps: (A) providing a sample to be tested wherein the sample contains a microbe; (B) adding an antibiotic into the sample, wherein the antibiotic serves to inhibit cell wall synthesis; (C) checking the sample by dielectrophoresis and observing a shape change of the microbe; and (D) determining whether the microbe is susceptible to the antibiotic according to the shape change thereof. The present invention also discloses a method for determining a minimum inhibitory concentration of the antibiotic.

Method for antibiotic susceptibility testing and determining minimum inhibitory concentration of the antibiotic

A method of microbial identification is disclosed. The method includes the steps of assembling dielectrophoretic particles modified with specific DNA probes on a surface thereof in a continuous fluid at a predetermined location in a microchannel to form a particle assembly by a negative dielectrophoretic force and a hydrodynamic force provided by the continuous fluid, narrowing gaps between the dielectrophoretic particles of the particle assembly to enhance the electric field in the gaps between the dielectrophoretic particles, injecting a fluid containing target DNAs of a target microbe into the microchannel at a predetermined flow rate to move the target DNAs toward the particle assembly and generating a positive dielectrophoretic force by the enhanced electric field to attract the target DNAs toward the dielectrophoretic particles of the particle assembly for hybridization with the DNA probes. The present invention also discloses a method of manipulation of nanoscale biomolecules.

Microbial identification and manipulation of nanoscale biomolecules

Growing community of inventors

Hualien County, Taiwan

Cheng-Che Chung