Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, R.o.c

Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan

Atomic Energy Council-institute of Nuclear Energy Research

Institute of Nuclear Energy Research, Atomic Energy Council

Cheng-Chang Hsieh

Chi-Fong Ai

Wen-Fa Tsai

Ching-Pei Tseng

Deng-Lain Lin

Mien-Win Wu

Hsin-Liang Chen

Ming-Chung Yang

En-Shih Chen

Jiun-Shen Chen

Der-Jun Jan

Tien-Hsiang Hsueh

Min-Chuan Wang

Peng Yang

Po-Wen Chen

Yan-Zheng Du

Chen-Te Chang

Jin-Yu Wu

Yung-Ching Liu

Tzong-Daw Wu

Deng-Lian Lin

A solar control film with improved moisture resistance function is provided. The solar control film includes a flexible substrate, at least one infrared-reflective composite layer and an outer dielectric layer. The infrared-reflective composite layer includes a dielectric sublayer and a metal sublayer. The dielectric sublayer is disposed on the flexible substrate, and the material of the dielectric sublayer includes TiO. The metal sublayer is disposed on the dielectric sublayer, and includes 8.3-16.4 atomic % Ag, 0.5-1.0 atomic % Ti, 81.0-90.9 atomic % N, and 0.3-0.6 atomic % noble metal, and the noble metal is Au, Pd or any combinations thereof. The outer dielectric layer is disposed on the infrared-reflective composite layer, and the material of the outer dielectric layer includes TiO. In this way, the provided solar control film can effectively suppress of forming white spots without significantly sacrificing its original function and characteristics.

Solar control film with improved moisture resistance function and manufacturing method thereof

A method for measuring a thickness of a thin film includes: a step of basing on a training database to establish an artificial neural network, the training database including a plurality of modified spectra and a plurality of film thicknesses corresponding individually to the plurality of modified spectra; a step of measuring a sample having a coated film so as to obtain a spectrum; and, a step of running the artificial neural network already trained by the plurality of modified spectra so as to use the spectrum to estimate a thickness of the coated film on the sample. In addition, a system related to the method for measuring a thickness of a thin film is provided to include a measuring unit, a spectrometer and a processing unit.

Method and system for measuring thickness of thin film

The present invention discloses a method for fabricating an electrochromic device, which adopts the vacuum cathodic arc-plasma deposition to comprise five layers with an ionic conduction layer (electrolyte) in contact with an electrochromic (EC) layer and an ion storage (complementary) layer, all sandwiched between two transparent conducting layers sequentially on a substrate. The method owns superior deposition efficiency and the fabricated thin film structures have higher crystalline homogeneity. In addition, thanks to the nanometer pores in the thin film structures, the electric capacity as well as the ion mobility are greater. Consequently, the reaction efficiency for bleaching or coloring is enhanced.

Method for fabricating electrochromic device

A vacuum coating apparatus includes at least a chamber, an arc discharge plasma source, a feeding-reeling unit, and a roller set. The first and second openings are connecting with the feeding or reeling unit so as to allow the substrate to enter and leave the chamber therethrough, respectively. The arc discharge plasma source located inside the chamber generates the plasma, which discharges radially from the arc discharge plasma source as its center. The roller set includes a plurality of the first rollers, which are located in the chamber and enclosing the arc discharge plasma source. A first surface of the substrate is facing the plurality of the first rollers and contacts tightly on the periphery of the first rollers so that the first rollers can rotate by the moving of the substrate. The material evaporated and emitted by the plasma is attached onto the first surface of the substrate.

Vacuum coating apparatus

The present invention relates to a roll-to-roll hybrid plasma modular coating system, which comprises: at least one arc plasma processing unit, at least one magnetron sputtering plasma processing unit, a metallic film and at least one substrate feeding unit. Each of the arc plasma processing unit is formed with a first chamber and an arc plasma source. Each of the magnetron sputtering plasma processing unit is formed with a second chamber and at least one magnetron sputtering plasma source. The metallic film is disposed in the arc plasma processing unit to avoid chamber wall being deposited by the arc plasma source; There are at least one arc plasma processing unit, at least one magnetron sputtering plasma processing unit and at least one winding/unwinding unit connected in series to lay at least one thin layer by arc plasma deposition or by magnetron sputtering plasma onto substrate material.

Roll-to-roll hybrid plasma modular coating system

A high frequency plasma apparatus includes a reaction chamber, a first electrode, a second electrode, and a plurality of feed points located at one of the two electrodes at least. The feed points are used to simultaneously generate a first standing wave and a second standing wave, with different temporal and spatial patterns. By adjusting amplitudes of the two standing waves and the temporal and spatial phase differences between the two standing waves appropriately, plasma uniformity of the high frequency plasma apparatus can be effectively improved.

Apparatus of high frequency plasma

A large-area plasma generating apparatus is disclosed, which includes a reaction chamber; a first electrode disposed in the reaction chamber; a second electrode parallel with the first electrode and disposed in the reaction chamber; and a discharge region formed between the first and second electrodes and a plasma can be formed therein; wherein a travelling wave or a traveling-wave-like electromagnetic field is generated via at least one of the first and second electrodes and travels from one end of the discharge region to its opposite end, so as to uniform the plasma in the discharge region.

Large-area plasma generating apparatus

Disclosed is an atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.

Apparatus for double-plasma graft polymerization at atmospheric pressure

An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.

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Chiayi, Taiwan

Cheng-Chang Hsieh