Dell Products Inc.

Shanghai Shenzhou New Energy Development Co., Ltd.

Chen Zhao

Qingqiang Guo

Lei Shi

Haifang Zhai

John Charles Donachy

Weidong Zuo

Yuxin Chen

Nicholas Lenn Poteracki

Fei Zheng

Gemma Hui Chen

Harris Di

Zhongwei Zhang

Zhongli Ruan

Yuxue Zhao

Corbett B Schoenfelt

An information handling system coupled in rails of a rack enclosure is secured in place by a latch managed by a handle coupled to opposing sides of the information handling system housing and disposed across a front face of the housing. When the latch is locked, the handle rotates up and down at the housing front face to offer end user access to components of the information handling system. A latch actuator in the handle unlocks the latch by engaging a cam lock in a pivot plate so that rotation of the handle translates to the pivot plate to release the housing for movement on the rails.

Information handling system rack release latch having vertical movement in a latched state

A gear train side latching mechanism may include a bracket having one or more guiding features, a handle mechanically coupled to the bracket via the one or more guiding features such that the handle is linearly movable with respect to the bracket, a rack mechanically coupled to the handle comprising a first plurality of gear teeth and configured to move linearly relative to the bracket in a fixed relation to the handle, a driving gear rotatably coupled to the bracket and comprising a compound circular spur gear having a second plurality of gear teeth on an outer diameter of the driving gear and a third plurality of gear teeth on an inner diameter of the driving gear, wherein the second plurality of gear teeth are mechanically coupled to the first plurality of gear teeth, and an actuator gear rotatably coupled to the bracket and comprising a fourth plurality of gear teeth mechanically coupled to the third plurality of gear teeth and further comprising one or more features configured to engage with a corresponding engagement feature of a mechanical member. The gear train side latching mechanism may be arranged such that linear motion of the handle relative to the bracket transmits mechanical energy to the actuator gear via the rack and the driving gear to cause the actuator gear to mechanically interact with the engagement feature to transmit mechanical energy to the engagement feature.

Gear train side latching mechanism for modular information handling resource

Embodiments include expansion cards that provide a specialized capability, such as networking, when coupled to an Information Handling System (IHS). The expansion card embodiments include a printed circuit board (PCB) of a first width and a heat sink located on a top surface of the PCB. The expansion cards also include pins located on a distal end of the PCB, where the pins are received by a connector of the IHS. Embodiments include a button operable for ejecting a latch of the expansion card from a stored position in response to pressing the button. When ejected, the latch remains within the first width of the PCB, thus supporting high-density configurations of expansion cards. The ejected latch is further operable for an administrator to easily pull the expansion card from the IHS. Expansion card embodiments may also include vents that provide pathways for ventilating heated air away from the heat sink.

Hot-pluggable expansion card supporting high-density configurations

A wet etching method for an N-type bifacial cell including: (1) providing an N-type silicon wafer, proceeding with surface structuralization on the N-type silicon wafer, and producing a PN junction on a surface of the N-type silicon wafer by using a boron diffusion technique; (2) proceeding with a first mixed acid washing, etching the PN junction on an edge and a back surface of the N-type silicon wafer; (3) proceeding with a first pure water washing and a first alkaline washing, removing residual acid solution from the surface of the N-type silicon wafer; (4) proceeding with a second pure water washing and a second mixed acid washing, removing residual impurities from the surface of the N-type silicon wafer; (5) proceeding with a third pure water washing and air drying; and (6) after air drying, completing etching on the N-type bifacial cell.

Wet etching method for an N-type bifacial cell

Growing community of inventors

Shanghai, China

Chen Zhao