Taiwan Semiconductor Manufacturing Comp. Ltd.

Chen-Yuan Wang

Yi-Hung Lin

Chung-Li Huang

Wilson Hsieh

Chi-Che Tseng

An IC manufacturing method includes forming first mandrels and second mandrels over a substrate; and forming first spacers on sidewalls of the first mandrels and second spacers on sidewalls of the second mandrels. Each of the first and second spacers has a loop structure with two curvy portions connected by two lines. The method further includes removing the first and second mandrels; and removing the curvy portions from each of the first spacers without removing the curvy portions from the second spacers. The second spacers are used for monitoring variations of the IC fabrication processes.

Growing community of inventors

Hsin-Chu, Taiwan

Chen-Yuan Wang