Beijing Naura Microelectronics Equipment Co., Ltd.

Chen Niu

Gang Wei

Jing Wang

Jing Yang

Song Wang

Jinrong Zhao

Jinji Xu

Hengyi Su

A coil structure includes a coil set including a first coil and a second coil. The first coil and the second coil are wound to form an annular area. A first end of the first coil and a first end of the second coil are close to an inner ring of the annular area. A second end of the first coil and a second end of the second coil are close to an outer ring of the annular area. The first end of the first coil is electrically connected to the first end of the second coil. A first projection-of the first coil on a plane perpendicular to an axial direction of the coil structure and a second projection of the second coil on the plane are mirror-symmetrical to each other.

Coil structure and plasma processing apparatus

The present disclosure provides an induction coil assembly and a reaction chamber. The induction coil assembly includes an induction coil arranged over a dielectric window of the reaction chamber. Two ends of the induction coil include a power input end and a ground end, respectively. A vertical spacing between the two ends of the induction coil and the dielectric window is greater than a vertical spacing between a portion between the two ends of the induction coil and the dielectric window. The induction coil and the reaction chamber provided by the present disclosure may reduce the capacitive coupling of the two ends of the induction coil by ensuring that the coupling strength of an RF magnetic field satisfies the requirement to reduce sputtering on the dielectric window and improve process results.

Induction coil assembly and reaction chamber

Growing community of inventors

Beijing, China

Chen Niu