Industrial Technology Research Institute

Chen-Hsun Du

Teng-Yu Wang

Chorng-Jye Huang

Chao-Cheng Lin

Chien-Hsun Chen

Shih-Peng Hsu

Han-Chang Liu

Chun-Ming Yeh

Chen-Cheng Lin

Chung-Yuan Kung

Chun-Heng Chen

Ching-Hsi Lin

Chung-Wen Lan

Jui-Chung Hsiao

Chien-Kai Peng

A solar cell includes a photoelectric conversion layer, a doped layer, a first passivation layer, a first TCO layer, a front electrode and a back electrode. The doped layer is disposed on the front surface of the photoelectric conversion layer. The first passivation layer is disposed on the doped layer, wherein the first passivation layer has a plurality of openings exposing a portion of the doped layer. The first TCO layer is disposed on the first passivation layer and in the openings, and directly contacts the exposed doped layer via the openings, wherein a ratio of an area of the openings to an area of the first TCO layer is between 0.01 and 0.5. The front electrode is disposed on the first TCO layer. The back electrode is disposed on the back surface of the photoelectric conversion layer.

Solar cell

A solar cell is provided. The solar cell includes a Si substrate having a first surface and a second surface opposite to each other, an emitter, a first electrode, a doped region, a passivation layer, a doped polysilicon layer, a semiconductor layer, and a second electrode. The emitter is disposed on the first surface. The first electrode is disposed on the emitter. The doped region is disposed in the second surface. The passivation layer is disposed on the second surface. The doped polysilicon layer is disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface. The semiconductor layer is disposed on the doped polysilicon layer and in the holes. The band gap of the semiconductor layer is greater than that of the Si substrate. The second electrode is disposed on the semiconductor layer.

The disclosure provides a method for fabricating a semiconductor layer having a textured surface, including: (a) providing a textured substrate; (b) forming at least one semiconductor layer on the textured substrate; (c) forming a metal layer on the semiconductor layer; and (d) conducting a thermal process or a low temperature process to the textured substrate, the semiconductor layer and the metal layer, wherein the semiconductor layer is separated from the textured substrate by the thermal process to obtain the semiconductor layer having the metal layer and a textured surface.

Method for fabricating semiconductor layer having textured surface and method for fabricating solar cell

Provided is an electrode of a solar cell including a first electrode layer, a photoelectric conversion layer, an antireflective layer, and a second electrode layer. The first electrode layer is disposed on the photoelectric conversion layer. The antireflective layer is disposed on the photoelectric conversion layer to cover the first electrode layer. The second electrode layer is disposed on the antireflective layer and electrically connected to the first electrode layer, wherein a material of the first electrode layer does not react with the photoelectric conversion layer and the antireflective layer during a sintering process, and at least a material of the second electrode layer reacts with the antireflective layer during the sintering process.

Electrode of solar cell

The disclosure provides a method for fabricating a semiconductor layer having a textured surface, including: (a) providing a textured substrate; (b) forming at least one semiconductor layer on the textured substrate; (c) forming a metal layer on the semiconductor layer; and (d) conducting a thermal process to the textured substrate, the semiconductor layer and the metal layer, wherein the semiconductor layer is separated from the textured substrate by the thermal process to obtain the semiconductor layer having the metal layer and a textured surface.

A fabricating method of an electrode of a solar cell includes forming a first electrode layer on a photoelectric conversion layer, forming an antireflective layer on the photoelectric conversion layer to cover the first electrode layer, forming a second electrode layer on the antireflective layer, and performing a sintering process. A material of the first electrode layer does not react with the photoelectric conversion layer and the antireflective layer during the sintering process, while at least a material of the second electrode layer reacts with the antireflective layer during the sintering process. The sintering process is performed, such that the second electrode layer reacts with the antireflective layer, and the second electrode layer penetrates the antireflective layer to electrically connect the first electrode layer.

Electrode of solar cell and fabricating method thereof

A surface texturization method is provided. First, a polymer film is formed on a substrate. Thereafter, a heating treatment is performed on the substrate. The heating treatment results in a textured polymer film having island-shaped and/or microcrack-shaped patterns. Afterwards, an etching process is performed using the textured polymer film as a mask, so as to remove a portion of the substrate to form a textured structure on the surface of the substrate.

Surface texturization method

A surface texturization process for a silicon wafer, which is applied to a method for making a solar cell, is provided. The surface texturization process substantially comprises: 1) providing an acidic mixed solution; 2) immersing the silicon wafer in the acidic mixed solution; and 3) etching the acidic mixed solution for a predetermined time section. The mixed acidic solution includes nitric acid and ammonium fluoride and a predetermined mixture selecting from the group consisting of phosphoric acid, sulfuric acid or acetic acid.

Growing community of inventors

Taipei, Taiwan

Chen-Hsun Du