Taiwan Semiconductor Manufacturing Comp. Ltd.

Chen-Hsiang Hung

Chia-Ping Lai

Chung-Chuan Tseng

Li-Hsin Chu

A semiconductor device includes: a photodiode formed in a substrate; and at least one transistor having a gate feature that comprises a first portion and a second portion coupled to an end of the first portion, the first portion disposed above and extending along a major surface of the substrate and the second portion extending from the major surface of the substrate into the substrate, wherein the photodiode and the at least one transistor at least partially form a pixel.

Image sensor device

A method of making a semiconductor device, includes: providing a first dielectric layer; sequentially forming a first metal layer, a dummy capacitor dielectric layer, and a second metal layer over the first dielectric layer; and using a single mask layer with two patterns to simultaneously recess two portions of the second metal layer so as to define a metal thin film of a resistor and a top metal plate of a capacitor.

Growing community of inventors

Kaohsiung, Taiwan

Chen-Hsiang Hung