Zhen Ding Technology Co., Ltd.

Chen-Feng Yen

Shou-Jui Hsiang

Mao-Feng Hsu

Yen-Chin Hsiao

Chang-Hung Lee

Szu-Hsiang Su

Chi-Fei Huang

Pei-Jung Wu

Sheng-Feng Chung

Yi-Fang Lin

A method for manufacturing an electromagnetic shielding film of reduced thickness and a simplified manufacturing process includes forming a conductive ink layer by inkjet printing, on a component to be shielded, forming an insulative ink layer on the conductive ink layer by inkjet printing, and sintering the conductive ink layer and the insulative ink layer to form an electromagnetic shielding layer and an insulative layer, thereby obtaining the electromagnetic shielding film.

Method for manufacturing electromagnetic shielding film

A photosensitive resin composition comprises a modified polyimide polymer having a chemical structural formula of: photosensitive monomers, a bisphenol A epoxy resin, a photo-initiator, and a pigment. The modified polyimide polymer is made by a reaction of a polyimide polymer having a chemical structural formula of: and glycidyl methacrylate. The carboxyl group of the polyimide polymer reacts with the epoxy group of glycidyl methacrylate. The polyimide polymer is made by a reaction of dianhydride monomers each having an A group, diamine monomers each having the R group, diamine monomers each having the Rgroup, and diamine monomers each having the Rgroup. The diamine monomer having R group is a diamine compound having R group bonding with the carboxyl group. The diamine monomer having Rgroup is a soft long-chain diamine monomer. Rgroup comprises at least one secondary amine group or tertiary amine group.

Photosensitive resin composition, and polymer film made therefrom

A non-toxic water soluble photosensitive resin composition able to function as a solder mask coating comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator. These elements are all water soluble or water dispersible. The polymer containing oxazolinyl and the photosensitive monomer have a plurality of carbon-carbon double bonds. The polymer containing oxazolinyl and the photosensitive monomer are polymerized to form a dense cross-linking network structure when the water soluble photosensitive resin composition is exposed to ultraviolet radiation. A film using the water soluble photosensitive resin composition is also provided.

Water soluble photosensitive resin composition and film using same

A non-reactive photosensitive resin composition storable at room temperature comprises a carboxylic acid-modified bisphenol epoxy (meth)acrylate, a photosensitive monomer, a photosensitive prepolymer, a photo-initiator, and a coloring agent. Each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer, and photosensitive prepolymer has a plurality of carbon-carbon double bonds, so that the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer may be polymerized to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation. A film and a printed circuit board using the photosensitive resin composition are also provided.

Growing community of inventors

Taoyuan, Taiwan

Chen-Feng Yen