Element Six Technologies Limited

Chee-Leong Lee

Geoffrey Alan Scarsbrook

Ian Friel

Erdan Gu

Martin David Dawson

A polycrystalline CVD diamond material comprising a surface having a surface roughness Rof less than 5 nm, wherein said surface is damage free to the extent that if an anisotropic thermal revealing etch is applied thereto, a number density of defects revealed by the anisotropic thermal revealing etch is less than 100 per mm.

Plasma etching of diamond surfaces

The present invention relates to a method of producing a diamond surface including the steps of providing an original diamond surface, subjecting the original diamond surface to plasma etching to remove at least 2 nm of material from the original surface and produce a plasma etched surface, the roughness Rof the plasma etched surface at the location of the etched surface where the greatest depth of material has been removed satisfying at least one of the following conditions: Rof the plasma etched surface is less than 1.5 times the roughness of Rof the original surface, or Rof the plasma etched surface is less than 1 nm.

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Berkshire, United Kingdom

Chee-Leong Lee