Taiwan Semiconductor Manufacturing Comp. Ltd.

Che Ying Hsu

Chia-Shiung Tsai

Yeur-Luen Tu

Chung-Yi Yu

Da-Hsiang Chou

Ping-Yin Liu

Martin Liu

Provided is an apparatus and a method of holding a device. The apparatus includes a wafer chuck having first and second holes that extend therethrough, and a pressure control structure that can independently and selectively vary a fluid pressure in each of the first and second holes between pressures above and below an ambient pressure. The method includes providing a wafer chuck having first and second holes that extend therethrough, and independently and selectively varying a fluid pressure in each of the first and second holes between pressures above and below an ambient pressure.

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Tianjhong, Taiwan

Che Ying Hsu