Taiwan Semiconductor Manufacturing Comp. Ltd.

Che-Rong Laing

Hua-Shu Ivan Wu

Tsung-Mu Lai

Ming-Chih Chang

Yung-Yao Lee

Li-Kong Turn

Ping-Hsi Yang

Methods for detecting and monitoring defects in a resist material are disclosed. In an example, a method includes forming a resist layer over a substrate; developing the resist layer; washing the developed resist layer with a thinner wash solution, wherein the washing reveals any negatively charged defects in the developed resist layer; and after the washing, inspecting for the negatively charged defects.

Defect monitoring for resist layer

A method and a structure are provided for preventing lift-off of a semiconductor monitor pattern from a substrate. A semiconductor structure and a semiconductor monitor structure are formed on a substrate. A material layer is formed covering the semiconductor monitor structure. A part of the semiconductor structure is removed without removing the semiconductor monitor structure, by using the material layer as an etch protection layer. A mask for the method is also provided. The mask includes a clear area and a dark area. The dark area prevents a semiconductor monitor structure from being subjected to exposure so as to form a material layer covering the semiconductor monitor structure and prevent removal of the semiconductor monitor structure from the substrate while a part of a semiconductor structure is removed.

Semiconductor structures

Semiconductor methods and structures

Growing community of inventors

Taipei, Taiwan

Che-Rong Laing