National Central University

Industrial Technology Research Institute

Che-Lung Hsu

Jenq-Yang Chang

Chien-Chieh Lee

Zong-Ru Tu

Jinn-Kong Sheu

Jian-Shian Lin

Yeeu-Chang Lee

Yun-Chih Lee

Ya-Lun Tsai

Shen-Hang Tu

Mao-Jen Wu

Chih-Ming Wang

Chih-Chieh Su

Mount-Learn Wu

Yung-Chih Liu

Yue-Hong Chou

A diffraction grating recording medium including a waveguide layer and a grating structure layer is provided. The waveguide layer has a reflective surface and a light incident surface, in which a thickness of the waveguide layer is between 100 nanometers and 2 micrometers, and the reflective surface reflects a light that enters the waveguide layer from the light incident layer. The grating structure layer is disposed on the light incident surface of the waveguide layer, in which the grating structure layer has a plurality of diffractive elements, and the arranging period of the diffractive elements is between 50 nanometers and 900 nanometers.

Diffraction grating recording medium

A structure of light emitting diode (LED) effectively reduces its spectral width. The LED structure is applied in a three color mixing of a backlight module to broaden a color space and to improve a saturation of a color display. A grating structure is used as a waveguide layer to coordinate with the LED structure. The present invention does not affect the original thermo and electrical characteristics of the LED structure and has a simple fabrication method.

LED device having reduced spectrum

A silicon bulk-micromachining technology is used to fabricate a GMR filter by exploiting the structure of a suspended silicon nitride (SiNx) membrane on the silicon substrate. A first silicon nitride (SiNx) thin film and a second silicon nitride (SiNx) thin film are formed on opposite sides of the silicon substrate. A first opening is defined in the first silicon nitride (SiNx) thin film, and a grating structure is defined in the second silicon nitride (SiNx) thin film. By etching off a portion of the silicon substrate exposed from the first opening until a portion of the second silicon nitride (SiNx) thin film is exposed from the first opening, a light path space is defined.

Guided-mode resonance filter and fabrication method of same

Growing community of inventors

Jhongli, Taiwan

Che-Lung Hsu