Amazing Microelectronic Corporation

Other

Industrial Technology Research Institute

Transpacific IP Limited

Vanguard International Semiconductor Corporation

Silicon Integrated Systems Corporation

Amazing Microelectronics Corp.

Che-Hao Chuang

Ming-Dou Ker

Kun-Hsien Lin

Ryan Hsin-Chin Jiang

Chih-Ting Yeh

Chyh-Yih Chang

Yu-Da Shiu

Sung-Chih Huang

Zi-Ping Chen

Tang-Kuei Tseng

Hsin-Chin Jiang

Wen-Yi Chen

Geeng-Lih Lin

Wen-Yu Lo

Yu-Shu Shen

Tun-Chih Yang

Chia-Sheng Tsai

Kuo-Chung Lee

A transient voltage suppressor with adjustable trigger and holding voltages is provided, including a heavily doped substrate of a first conductivity type connected to a first node, a lightly doped epitaxial layer of a second conductivity type on the substrate, a first and third well region of the first conductivity type, a second well region of the second conductivity type, a first and third heavily doped region of the second conductivity type and a second heavily doped region of the first conductivity type. The heavily doped regions are commonly electrically connected to a second node, and individually disposed in the well regions. Trenches are disposed opposite in the substrate for electrical isolation. A floating base bipolar junction transistor and silicon controlled rectifier can be respectively formed under a positive and negative surged mode. Accordingly, the invention is advantageous of superior electrical performances, high layout flexibility and low area consumption.

Transient voltage suppressor with adjustable trigger and holding voltages

A transient voltage suppression device includes at least one diode string, a power clamp device, at least one first bypass diode, and at least two second bypass diodes. The diode string is coupled between a power terminal and a common bus and coupled to an input output (I/O) port. The power clamp device is coupled between the power terminal and the common bus. The first bypass diode is coupled between the common bus and a ground terminal. The second bypass diodes are coupled in series, coupled between the common bus and the ground terminal, and coupled to the first bypass diode in reverse parallel. Alternatively, the first bypass diode and the second bypass diodes are replaced with at least one bi-directional electrostatic discharge (ESD) device.

Transient voltage suppression device

A vertical bipolar transistor device includes a heavily-doped semiconductor substrate, a first semiconductor epitaxial layer, at least one doped well, an isolation structure, and an external conductor. The heavily-doped semiconductor substrate and the doped well have a first conductivity type, and the first semiconductor epitaxial layer has a second conductivity type. The first semiconductor epitaxial layer is formed on the heavily-doped semiconductor substrate. The doped well is formed in the first semiconductor epitaxial layer. The isolation structure, formed in the heavily-doped semiconductor substrate and the first semiconductor epitaxial layer, surrounds the first semiconductor epitaxial layer and the at least one doped well. The external conductor is arranged outside the first semiconductor epitaxial layer and the doped well and electrically connected to the first semiconductor epitaxial layer and the doped well.

Vertical bipolar transistor device

A floating base silicon controlled rectifier is provided, which at least comprises a first conductivity type layer; a second conductivity type well formed in the first conductivity type layer; a first conductivity type heavily doped region coupled to a first node and formed in the second conductivity type well; and a second conductivity type heavily doped region coupled to a second node and formed in the first conductivity type layer. The first conductivity type and the second conductivity type are opposite. When the first conductivity type is N type, the second conductivity type is P type. Alternatively, when the first conductivity type is P type, the second conductivity type is N type. By employing the proposed present invention, the floating base silicon controlled rectifier acts as a forward diode, and an input capacitance can be greatly reduced.

Floating base silicon controlled rectifier

A vertical bipolar transistor device is disclosed. The vertical bipolar transistor device includes a heavily-doped semiconductor substrate, a first semiconductor epitaxial layer, at least one first doped well, and an external conductor. The heavily-doped semiconductor substrate and the first doped well have a first conductivity type. The first semiconductor epitaxial layer has a second conductivity type. The first semiconductor epitaxial layer is formed on the heavily-doped semiconductor substrate. The first doped well is formed in the first semiconductor epitaxial layer. The external conductor is arranged outside the heavily-doped semiconductor substrate and the first semiconductor epitaxial layer and electrically connected to the heavily-doped semiconductor substrate and the first semiconductor epitaxial layer.

An embedded NMOS triggered silicon controlled rectification device includes a P-type substrate, at least one rectifying zone, and at least one trigger. The rectifying zone includes a first N-type heavily doped area, an N-type well, and a first P-type heavily doped area. Alternatively, the device includes an N-type substrate, a first P-type well, at least one rectifying zone, and at least one trigger. The rectifying zone includes a second P-type well, a first N-type heavily doped area, and a first P-type heavily doped area. The trigger cooperates with the P-type substrate or the first P-type well to form at least one NMOSFET. The trigger is independent to the rectifying zone. The first P-type heavily doped area is arranged between the trigger and the first N-type heavily doped area.

Embedded N-channel metal oxide semiconductor (nmos) triggered silicon controlled rectification device

A transient voltage suppression device includes a lightly-doped semiconductor structure, a first doped well, a first heavily-doped area, a first buried area, and a second heavily-doped area. The lightly-doped semiconductor structure has a first conductivity type. The first doped well has a second conductivity type and is formed in the lightly-doped semiconductor structure. The first heavily-doped area has the second conductivity type and is formed in the first doped well. The first buried area has the first conductivity type and is formed in the lightly-doped semiconductor structure and under the first doped well, and the first buried area is adjacent to the first doped well. The second heavily-doped area has the second conductivity type and is formed in the lightly-doped semiconductor structure.

A lateral transient voltage suppressor device is provided, comprising a doped substrate, a lateral clamping structure disposed on the doped substrate, a buried doped layer disposed between the doped substrate and the lateral clamping structure for isolation, at least one diode module, and at least one trench arranged in the doped substrate, having a depth not less than that of the buried doped layer, and being disposed between the lateral clamping structure and the at least one diode module for electrical isolation. The doped substrate and the buried doped layer have opposite conductivity types such that the doped substrate is electrically floating. The buried doped layer can be further disposed to separate the diode module from the doped substrate. By employing the proposed invention, the lateral transient voltage suppressor device is advantageous of maintaining both a lower clamping voltage as well as a reduced dynamic resistance.

Lateral transient voltage suppressor device

An improved transient voltage suppression device includes a semiconductor substrate, a transient voltage suppressor, at least one first diode, at least one conductive pad, and at least one second diode. The transient voltage suppressor has an N-type heavily-doped clamping area. The first anode of the first diode is electrically connected to the N-type heavily-doped clamping area. The conductive pad is electrically connected to the first cathode of the first diode. The second anode of the second diode is electrically connected to the conductive pad and the second cathode of the second diode is electrically connected to the transient voltage suppressor. The first anode is closer to the N-type heavily-doped clamping area rather than the conductive pad. The conductive pad is closer to the N-type heavily-doped clamping area rather than the second anode.

A heat-dissipating Zener diode includes a heavily-doped semiconductor substrate having a first conductivity type, a first epitaxial layer having the first conductivity type, a first heavily-doped area having a second conductivity type, a second epitaxial layer, and a second heavily-doped area having the second conductivity type or the first conductivity type. The first epitaxial layer is formed on the heavily-doped semiconductor substrate. The first heavily-doped area is formed in the first epitaxial layer and spaced from the heavily-doped semiconductor substrate. The second epitaxial layer is formed on the first epitaxial layer and penetrated with a first doped area, and the first doped area has the second conductivity type and contacts the first heavily-doped area. The second heavily-doped area is formed in the first doped area.

Heat-dissipating Zener diode

In a test method for eliminating electrostatic charges, at least one test process is firstly performed by a test equipment comprising a tester and a platform, and electrostatic charges are generated on the test equipment in the test process. In the test process, the tester contacts and tests at least one tested integrated circuit (IC) on a test area of the platform, and then the tested IC is removed from the tester and the test area. Next, a conduction device which is grounded is moved to the test area, so that the tester contacts the conduction device to discharge the electrostatic charges to ground. Next, the conduction device is removed from the tester and the test area. Finally, the method returns to the test process to test the next tested IC.

Test method for eliminating electrostatic charges

A three-dimension (3D) integrated circuit (IC) package is disclosed. The 3D IC package has a package substrate having a surface. At least one integrated circuit (IC) chip with or without suppressing a transient voltage and at least one transient voltage suppressor (TVS) chip are arranged on the surface of the substrate and electrically connected with each other. The IC chip is independent from the TVS chip. The IC chip and the TVS chip stacked on each other are arranged on the package substrate. Alternatively, the IC chip and the TVS chip are together arranged on an interposer formed on the package substrate.

Three-dimension (3D) integrated circuit (IC) package

A transient voltage suppressor without leakage current is disclosed, which comprises a P-substrate. There is an N-type epitaxial layer formed on the P-substrate, and a first N-heavily doped area, a first P-heavily doped area, an electrostatic discharge (ESD) device and at least one deep isolation trench are formed in the N-epitaxial layer. A first N-buried area is formed in the bottom of the N-epitaxial layer to neighbor the P-substrate and located below the first N-heavily doped area and the first P-heavily doped area. The ESD device is coupled to the first N-heavily doped area. The deep isolation trench is not only adjacent to the first N-heavily doped area, but has a depth greater than a depth of the first N-buried area, thereby separating the first N-buried area and the ESD device.

Transient voltage suppressor without leakage current

A vertical transient voltage suppressor for protecting an electronic device is disclosed. The vertical transient voltage includes a conductivity type substrate having highly doping concentration; a first type lightly doped region is arranged on the conductivity type substrate, wherein the conductivity type substrate and the first type lightly doped region respectively belong to opposite types; a first type heavily doped region and a second type heavily doped region are arranged in the first type lightly doped region, wherein the first and second type heavily doped regions and the conductivity type substrate belong to same types; and a deep first type heavily doped region is arranged on the conductivity type substrate and neighbors the first type lightly doped region, wherein the deep first type heavily doped region and the first type lightly doped region respectively belong to opposite types, and wherein the deep first type heavily doped region is coupled to the first type heavily doped region.

Growing community of inventors

Hsinchu, Taiwan

Che-Hao Chuang