Asml Netherlands B.v.

Asml Holding N.v.

Chattarbir Singh

Erik Roelof Loopstra

Johannes Onvlee

Frank Johannes Jacobus Van Boxtel

Jan Steven Christiaan Westerlaken

Christopher Charles Ward

Laurentius Johannes Adrianus Van Bokhoven

Koen Cuypers

Daniel Nathan Burbank

Marinus Jan Remie

Mark Josef Schuster

Robertus Nicodemus Jacobus Van Ballegoij

Marcelo Henrique De Andrade Oliveira

Henricus Anita Jozef Wilhemus Van De Ven

José Nilton Fonseca Junior

A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate () positioned between the movable stage () and the projection system (). The plate includes an opening () that comprises a first sidewall () and a second sidewall (). The plate may be configured to provide a gas flow pattern () in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Gas flow optimization in reticle stage environment

Growing community of inventors

Eindhoven, Netherlands

Chattarbir Singh