Hoechst Aktiengesellschaft

Clariant Corporation

Charlotte Eckes

Ralph R Dammel

Horst Roeschert

Walter Spiess

Georg Pawlowski

Gerhard Buhr

Juergen Fuchs

Bernd Hupfer

Geog Pawlowski

A negative-working radiation-sensitive mixture containing

Negative-working radiation-sensitive mixture, and radiation-sensitive

A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical,

Acid-cleavable radiation-sensitive compounds, positive working

Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,

Acid-cleavable radiation-sensitive compounds, radiation-sensitive

A photopolymerizable mixture for producing relief structures composed of highly heat-resistant polymers is described which is composed essentially of a soluble prepolymer containing photosensitive radicals bound in an ester-like manner to carboxyl groups, monomers and a photoinitiator, wherein the photoinitiator carries at least one trihalomethyl group which reacts when exposed to light. Of advantage is the fact that, even after exposure times which are by a factor of 4 to 5 shorter compared with conventional photopolymerizable mixtures, sharp-edged resist images can be obtained with a resolution of less than 3 .mu.m.

Growing community of inventors

Mainz, Germany

Charlotte Eckes