Applied Materials, Inc.

Charles Peter Auglis

Raymond Hoiman Hung

Hongqing Shan

Jeremiah T Pender

Henry Fong

Thomas Joseph Kropewnicki

A substrate cleaning method comprises exposing a substrate to an energized process gas to remove residue 60 and resist material from the substrate In one version, the process gas comprises cleaning gas, such as an oxygen-containing gas, and an additive gas, such as NH . In one version, the process gas is introduced to remove residue and resist material from the substrate and to remove residue from surfaces in the process chamber

Growing community of inventors

Plano, TX, United States of America

Charles Peter Auglis