Corning Incorporated

Corning Glass Works

Charles Michael Darcangelo

Robert Sabia

David Alan Tammaro

Aric Bruce Shorey

Harrie J Stevens

Steven Edward DeMartino

Daniel Duane Strong

John Christopher Thomas

Butchi Reddy Vaddi

Ljerka Ukrainczyk

Thierry Luc Alain Dannoux

Richard Orr Maschmeyer

Stuart Gray

Albert Roth Nieber

Steven Joseph Gregorski

Max R Montierth

Jeffrey Scott Cites

David Alan Deneka

Mark Andrew Stocker

Larry G Mann

Jose Mario Quintal

Priyank Paras Jain

Richard Bergman

Harold G Shafer, Jr

Paul Jeffrey Williamson

Paul S Schmitt

Joseph Fabian Ellison

Richard A Nasca

Robert D Sell

Yang-Chou M Ni

Robert M Hujar

Disclosed is a laminated glass structure with one or more inner glass layers with at least one in tension and two outer glass layers in compression wherein one or both of the outer layers at least partially wrap around the one or more inner layers at one or more of the edges of the laminated glass structure. Also disclosed is a process for forming a laminated glass structure, comprising providing a laminated glass structure, removing at least some glass from at least one the edges of the structure to produce a concavity in at the at least one edge and applying heat to the at least one edge.

Laminated glass structure and method of manufacture

A method includes forming a continuous ribbon of glass. The continuous ribbon includes a first surface, a second surface opposite the first surface, a first edge region, a second edge region opposite the first edge region, and a central region extending between the first edge region and the second edge region. Each of the first edge region and the second edge region has a greater thickness than the central region of the continuous ribbon. An indented pattern is formed longitudinally along the first edge region of the continuous ribbon by forming a first series of indentations in the first surface of the continuous ribbon and forming a second series of indentations in the second surface of the continuous ribbon. The indented pattern includes intermediate segments interconnected with one another by webs. Each intermediate segment is thicker than adjacent webs.

Apparatus and method for forming a glass sheet

An edge finishing apparatus includes a surface, a fluid delivery device configured to deliver at least one magnetorheological polishing fluid (MPF) ribbon to the at least one well, at least one magnet placed adjacent to the surface to selectively apply a magnetic field in a vicinity of the surface, and at least one holder placed in opposing relation to the surface, the at least one holder being configured to support at least one article such that an edge of the at least one article can be selectively immersed in the MPF ribbon delivered to the at least one well.

Edge finishing apparatus

Methods of finishing an edge of a glass sheet comprise the step of machining the edge of the glass sheet into a predetermined cross-sectional profile along a plane taken transverse to the edge of the glass sheet with an initial average edge strength ES. The methods also include the step of finishing the edge with at least one finishing member, such as an endless belt, without substantially changing a shape of the predetermined cross-sectional profile. In one example, a wet slurry including an abrasive can be applied to at least one of a finishing member and the edge of the glass sheet. After finishing the edge, example finished average edge strengths EScan be at least about 250 MPa. In addition or alternatively, in another example, the ratio ES/EScan be within a range of from about 1.6 to about 5.6.

Methods of finishing an edge of a glass sheet

A method of preparing an edge-strengthened article comprises polishing of an edge of an article having a first edge strength using magnetorheological finishing, wherein after the polishing the article has a second edge strength and the second edge strength is greater than the first edge strength.

Method of preparing an edge-strengthened article

A method of polishing a semiconductor layer formed on a transparent substrate is described, the method including measuring the thickness of the semiconductor from the substrate side of the semiconductor layer simultaneously with the polishing, and using the thickness measurement to modify the polishing.

Method of polishing a semiconductor-on-insulator structure

The invention utilizes colloidal silica soot () in a semiconductor process for chemical-mechanical planarizing a semiconductor integrated circuit workpiece () with a slurry (). The particulate abrasive agent colloidal solid sphere fused silica soot () provides a beneficial CMP slurry/process for semiconductor device manufacturing compared to standard semiconductor CMP slurries with conventional colloidal sol-gel or fumed silica.

Semiconductor processing silica soot abrasive slurry method for integrated circuit microelectronics

A method for producing lenses includes assembling a plurality of glass rods having a desired length into a single unit and cutting the single unit into multiple slices, each slice having a plurality of individual lenses. The method further includes finishing the slices to a desired thickness and surface finish and extracting the individual lenses from the slices.

Multi-lens finishing process

A two-part reagent method for polishing an inorganic silicate substrate is provided. The method comprises: providing a silicate substrate; providing a reagent comprising: a first part consisting essentially of an aqueous solution of at least one metal oxide abrasive selected from the group consisting of titania, zirconia, germania, and germania-doped silica; and a second part consisting essentially of an alkali aqueous solution of colloidal silica having a buffered pH value of at least about 10; polishing a surface of said substrate with the metal oxide abrasive aqueous solution to a surface roughness (Ra) ranging from about 6 &angst; to about 10 &angst;; and further polishing the surface with said alkali aqueous solution of colloidal silica to a roughness of less than or equal to about 5 &angst;.

Aqueous solution for colloidal polishing of silicate substrates

The invention provides a means for making below 200 nm VUV optical microlithography lens elements and preforms therefor. The inventive methods include polishing a fluoride optical lithography crystal with cerium to a surface roughness less than five angstroms. The invention includes making a 157 nm VUV optical lithography element preform by polishing a calcium fluoride crystal with cerium oxide polish.

Angstrom polishing of calcium fluoride optical VUV microlithography lens elements and preforms

A polishing application uses alkali, colloidal silica for polishing silicate-based glasses. Preferably, the silica solutions are adjusted to a pH of or above 10. The polished silicate-based glass surfaces have surface finishes consistently below 2 &angst; Ra. The unique method first polishes a surface of the substrate with an aqueous solution of at least one metal oxide abrasive and further polishes the surface of the substrate with an alkali aqueous solution of colloidal silica. Preferably, to the final smoothness of 2 &angst; Ra or less.

Colloidal polishing of fused silica

An optical surface on a glass preform for an optical lens is simultaneously ground and polished. A glass blank is rotated by a work spindle mounted in an air bearing. A resin bonded diamond cutting ring is rotated by a tool spindle mounted in an air bearing. The axis of the tool spindle is set at an angle with respect to the axis of the work spindle with the edge of the cutting ring being centered on the axis of rotation of the blank. One of the spindles is moved linearly with respect to the other to move the cutting ring into engagement with the blank for grinding a precisely shaped, polished optical surface thereon. The spindles are mounted on a table and a driving motor for the linear drive is remote from the table to isolate the spindles from the vibration of the motor.

Simultaneously grinding and polishing preforms for optical lenses

Disclosed is an optical waveguide fiber coating system having means for cooling the hot fiber prior to the time that the fiber enters the coating apparatus. The cooling means comprises an elongated coolant tube through which the fiber passes. Cool dry helium is flowed into that end of the coolant tube into which the fiber enters. In a preferred embodiment, the coolant tube is surrounding by a chamber containing a liquified gas. The helium is cooled by flowing through a coil submerged in the liquified gas prior to being flowed into the tube. An iris diaphragm located at the fiber input end of the coolant tube prevents the entry of moist, warm air into that tube.

Growing community of inventors

Corning, NY, United States of America

Charles Michael Darcangelo