Brewer Science, Inc.

The University of Texas System

Other

Wallace, Inc.

Charles J Neef

Vandana Krishnamurthy

Robert Christian Cox

Daniel M Sullivan

James E Hessert

D Daniel Wallace

Jimmy D DeLong

John Patrick Ferraris

Runhui Huang

Clois E Powell

John Lee Massingill

Yubao Wang

Mandar R Bhave

Jinhua Dai

Michelle Fowler

Tantiboro Ouattara

Michelle Windsor

Juliet A M Snook

Michael B Swope

Krishnamurthy Vandana

Juliet AM Snook

Thermal barrier mixtures and method of making the thermal barrier mixtures are described herein. The thermal barrier mixtures may be used to make thermal barrier coatings. Thermal barrier mixture may include halloysite and one or more silicon compounds.

Thermal barrier mixtures and uses thereof

This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.

Non-covalently crosslinkable materials for photolithography processes

Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters.

Metal-oxide films from small molecules for lithographic applications

Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers are copolymers of a compound having the formulas  where: (1) each R is individually selected from the group consisting of &#x2014;OH, &#x2014;NH, hydrogen, aliphatics, and phenyls; and (2) L is selected from the group consisting of &#x2014;SO&#x2014; and &#x2014;CR'&#x2014;. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings

A swellable polymer gel composition for use in subterranean formations. The composition comprises water, a water soluble polymer, a water soluble crosslinking system and a swelling agent. The crosslinking system may be either a redox system or a chelating system. The amounts of the polymer and the crosslinking system are effective to form a substantially uniformly reacted tri-dimensional gel structure. To the gel solution, is added a swelling agent in an amount sufficient to increase the volume of the gel a predetermined percentage. The swelling agent may be a natural or a synthetic agent. A strengthening agent may be added to increase the gel strength of the composition. The composition has numerous uses and is particularly useful in oil industry applications such as plugging wells, sealing casing leaks and reducing water production from water-bearing hydrocarbon formations. The composition is economically produced, preserves the wellbore for future reentry in plugging operations, inhibits corrosion of casing by the hydration of water, inhibits the leaching of hazardous metal into the environment, and continuously expands in the presence of water.

Method for treating an underground formation

Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.

Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties

Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment the polymers of the composition include recurring monomers having the formulas where: (1) each R is individually selected from the group consisting of hydrogen, &#x2014;OH, aliphatics, and phenyls; and (2) L is selected from the group consisting of &#x2014;SO&#x2014; and &#x2014;CR'&#x2014;, where each R&#x2032; is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and &#x2014;CX, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of:where: The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Wet-developable anti-reflective compositions

Developer-soluble metal alkoxide coatings for microelectronic applications

Method and composition for forming water impermeable barrier

The present invention describes an improved method for the polymerization of &agr;,&agr;-dihalo-p-xylene's such as the &agr;,&agr;&prime;-dihalo-2-methoxy-5-(2-ethylhexyloxy)-xylene's. The procedure for synthesis is based on the specific order of addition of reagents and the use of an anionic initiator that allows control of the molecular weight of the polymer. The molecular weight control allows processability of the polymer which is important for its utility in applications including in light-emitting-diodes, field effect transistors and photovoltaic devices.

Growing community of inventors

Rolla, MO, United States of America

Charles J Neef