E.i. Dupont De Nemours and Company

The Chemours Company Tt, LLC

Charles David Musick

Raul A Gonzalez

John D Bolt

Narayanan Sankara Subramanian

Peter Jernakoff

Eugene Michael McCarron, Iii

James Nelson Tilton

Yung-Hsing Samson Hsu

Kunle Ogunde

Robert A Johns

Joseph J Zaher

Lu Zhang

Stephan Claude De La Veaux

James Timothy Cronin

Philipp Martin Niedenzu

Kevin J Leary

Austin Henry Reid, Jr

Robert E Bucher

Robert J Rossi

John Nicholas Birmingham

Stephen Claude De La Veaux

Yunghsing Samson Hsu

Barbara A Kirsch

Richard P Bernard

Kenneth Paul Klein

Timothy J Becnel

Kevin Joseph Leary

Robert J Rossie

Philipp M Niedinzu

Narayanan S Subramanian

Mustafa Akser

The disclosure provides a polymer composition comprising a treated inorganic particle having improved photostability and improved anti-microbial properties, wherein the treated inorganic particle comprises: a inorganic core particle; a first treatment of a silicon compound, wherein the silicon compound is added in a single step; and a second treatment comprising a co-precipitated zinc oxide and alumina.

Treated inorganic pigments having reduced photoactivity and improved anti-microbial properties and their use in polymer compositions

The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising: reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid titanium dioxide precursor and a liquid or finely divided solid compound comprising a element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, and Pb, into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200&#xb0; C. to about 1600&#xb0; C. to produce titanium dioxide particles that are coated by the oxide formed from the element.

Process for controlling particle size and additive coverage in the preparation of titanium dioxide

The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid silicon halide and liquid titanium dioxide precursor into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200&#xb0; C. to about 1600&#xb0; C. to produce titanium dioxide particles that are substantially encapsulated in silicon dioxide.

Process for controlling particle size and silica coverage in the preparation of titanium dioxide

The disclosure provides a treated inorganic particle, in particular a titanium dioxide particle, having reduced photoactivity, lower acid solubility and improved anti-microbial properties comprising: an inorganic core particle, in particular a titanium dioxide particle; a first treatment of silica, wherein the silica is added in a single step; and a second treatment comprising co-precipitated zinc oxide and alumina. These particles have reduced photoactivity, lower acid solubility and improved anti-microbial properties.

Treated inorganic particle

This disclosure relates to a process for producing titanium dioxide, comprising: a) reacting an alloy comprising a metal selected from the group consisting of aluminum, titanium and mixtures thereof, wherein either aluminum or titanium is a major component of the alloy, and an element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, Pb, and Bi, with chlorine gas to form chlorides of aluminum, titanium or mixtures thereof and chlorides of the element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, Pb, and Bi, at or above the boiling point of the chloride of the major component of the alloy; with the proviso that the element does not comprise Ti when the metal is Ti and does not comprise Al when the metal is Al; (b) adding titanium tetrachloride to the chlorides formed in step (a); (c) oxidizing the chlorides formed in step (a), and titanium tetrachloride of step (b); and (d) forming titanium dioxide dioxide comprising the oxide of aluminum and an oxide of an element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, Pb, and Bi.

Process for in-situ formation of chlorides in the preparation of titanium dioxide

The disclosure provides a coating composition comprising a treated inorganic particle having reduced photoactivity and improved anti-microbial properties, wherein the treated inorganic particle comprises: an inorganic core particle; a first treatment of a silicon compound, wherein the silicon compound is added in a single step; and a second treatment comprising co-precipitated zinc oxide and alumina.

Treated inorganic pigments having reduced photoactivity and improved anti-microbial properties and their use in coating compositions

The disclosure provides a paper slurry comprising a treated inorganic particle having reduced photoactivity and improved anti-microbial properties, wherein the treated inorganic pigment comprises: an inorganic core particle; a first treatment of a silicon compound, wherein the silicon compound is added in a single step; and a second treatment comprising a co-precipitated zinc oxide and alumina.

Treated inorganic pigments having reduced photoactivity and anti-microbial properties and their use in paper slurries

This disclosure relates to a process for producing titanium dioxide, comprising: a) reacting a alloy comprising silicon and aluminum having a melting point of about 482&#xb0; C. to about 660&#xb0; C., with chlorine gas at temperatures above 190&#xb0; C. to form chlorides of silicon and aluminum; b) adding titanium tetrachloride to the chlorides of silicon and aluminum of step (a); c) oxidizing the chlorides of silicon and aluminum and titanium tetrachloride of step (b); and d) forming titanium dioxide.

Process for in-situ formation of chlorides of silicon and aluminum in the preparation of titanium dioxide

A process for producing titanium dioxide, comprising: a) reacting an alloy comprising a metal selected from the group consisting of aluminum, titanium and mixtures thereof, wherein one metal is a major component of the alloy, and an element, with chlorine gas to form chlorides of aluminum, titanium or mixtures thereof and chlorides of the element, at or above the boiling point of the chloride of the major component of the alloy; with the proviso that the element does not comprise Ti when the metal is Ti and does not comprise Al when the metal is Al; (b) adding titanium tetrachloride to the chlorides formed in step (a); (c) oxidizing the chlorides formed in step (a), and titanium tetrachloride of step (b); and (d) forming titanium dioxide.

This disclosure relates to a process for producing titanium dioxide, comprising: reacting aluminum and an alloy comprising silicon and titanium having a silicon content of at least 5%, based on the weight of the ahoy, with chlorine gas at temperatures above 190&#xb0; C. to form chlorides of silicon, aluminum and titanium; adding titanium tetrachloride to the chlorides of silicon, aluminum and titanium; oxidizing the chlorides of silicon, aluminum and titanium and titanium tetrachloride; and forming titanium dioxide.

Process for in-situ formation of chlorides of silicon, aluminum and titanium in the preparation of titanium dioxide

One aspect of the invention is to provide a composition comprising a titanium dioxide particle having on the surface of said particle a substantially encapsulating layer comprising a pyrogenically-deposited metal oxide; said substantially encapsulating layer having on its surface at least one organic surface treatment material selected from an organo-silane, an organo-siloxane, a fluoro-silane, an organo-phosphonate, an organo-acid phosphate, an organo-pyrophosphate, an organo-polyphosphate, an organo-metaphosphate, an organo-phosphinate, an organo-sulfonic compound, a hydrocarbon-based carboxylic acid, an associated ester of a hydrocarbon-based carboxylic acid, a derivative of a hydrocarbon-based carboxylic acid, a hydrocarbon-based amide, a low molecular weight hydrocarbon wax, a low molecular weight polyolefin, a co-polymer of a low molecular weight polyolefin, a hydrocarbon-based polyol, a derivative of a hydrocarbon-based polyol, an alkanolamine, a derivative of an alkanolamine, an organic dispersing agent, or a mixture thereof. Another aspect of the invention is to provide processes for producing said composition.

Preparation of organic additive-treated, pyrogenic silica-encapsulated titanium dioxide particles

The disclosure relates to a process for making titanium dioxide, comprising: reacting titanium tetrachloride with oxygen by contacting the titanium tetrachloride with the oxygen in a vapor phase reactor under mixing conditions and at an elevated temperature to form a gaseous product stream containing titanium dioxide; separating the titanium dioxide from the gaseous product stream to form a process stream; analyzing the process stream to detect a concentration of titanium tetrachloride in the process stream; comparing the concentration of titanium tetrachloride detected in the process stream to an aim point concentration; and modifying the oxidation conditions to restore or maintain the concentration of titanium tetrachloride in the process stream at the aim point. In one embodiment, the process further comprises contacting the gaseous product stream with silicon tetrachloride under mixing conditions and at an elevated temperature to at least partially encapsulate the titanium dioxide with a silicon-containing compound and separating the at least partially encapsulated titanium dioxide from the gaseous product stream and analyzing the process stream to detect a concentration silicon tetrachloride for comparison to a silicon tetrachloride aim point concentration so that the conditions for silicon tetrachloride contacting can be modified to restore or maintain the concentration of silicon tetrachloride in the process stream.

Process for making titanium dioxide

This disclosure relates to a process for producing titanium dioxide, comprising:

Process for producing titanium dioxide

Titanium dioxide nanopowder is produced by a process, comprising:

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Waverly, TN, United States of America

Charles David Musick