Gte Laboratories Incorporated

Gte Service Corporation

Charles D'Angelo

Sergej-Tomislav V Buljan

Vinod K Sarin

Joseph G Baldoni, Ii

Helen E Rebenne

J Gary Baldoni, Ii

Single crystal whiskers of carbides, nitrides and carbonitrides of Ti, Zr, Hf, V, Nb, Ta, and W coated with one or more layers of different carbides, nitrides, or carbonitrides of Ti, Zr, Hf, Nb, Ta, or W or oxides of Al, Zr, or Hf. A process for the whisker production is also disclosed.

Metal carbide, nitride, or carbonitride whiskers coated with metal

A chemical vapor deposition process in which an internal reactor is disposed within a chemical vapor deposition reactor including means for enclosing a reaction chamber and means for heating the reaction chamber. The position at which the internal reactor is disposed relative to the heating means is selected to provide control of the temperature within the internal reactor. At least two solid precursor materials are placed in the internal reactor and are contacted with at least one precursor gas, reactive with the solid precursor materials to produce at least two reactant gases. These gases are directed to the reaction chamber to react with one or more additional reactants.

Internal reactor method for chemical vapor deposition

A reactor for producing single crystal metal carbide, nitride, or carbonitride whiskers, where the metal is one or more of Ti, Zr, Hf, Nb, Ta or W. The reactor walls and inner fixtures provide the substrate surfaces, greatly increasing the surface area available for whisker growth. Preferred substrate materials are nickel or high nickel alloy coated with TiC or TiN, or, for carbide or carbonitride whiskers, nickel impregnated graphite. An alternate embodiment provides a collecting chamber and vibrating means to mechanically detach whiskers, allowing for more efficient batch, or continuous operation.

Chemical vapor deposition reactor for producing metal carbide or nitride

Cutting tools, cutting tool inserts, and wear parts having improved mechanical and chemical wear resistance under demanding conditions of machining speed, temperature, or wear conditions comprising a monolithic or composite silicon nitride-based substrate having a hard adherent coating layer of a refractory aluminum nitride, and optionally an outer adherent coating layer of a refractory material. The preferred outer layer refractory materials are the carbides, nitrides, and carbonitrides of Ti, Zr, Hf, Nb, V, Ta, Cr, Mo, and W, and mixtures and solid solutions thereof, alumina and zirconia.

A1N coated silicon nitride based cutting tools

A CVD apparatus including an internal reactor for in-situ generation of source gases for the CVD reaction. The internal reactor comprises a shell for containing solid precursor material, inlet and outlet means for a precursor gas and the gaseous product respectively, and preferably gas distribution means and means for preventing entrainment of the solid precursor in the gas flow. The internal reactor is positioned within the CVD reactor to provide the optimum temperature for the reaction taking place within the internal reactor.

Internal reactor for chemical vapor deposition

A method for coating single crystal whiskers of carbides, nitrides or carbonitrides of Ti, Zr, Hf, V, Nb, Ta, or W with one or more layers of a carbide, nitride or carbonitride of Ti, Zr, Hf, Nb, Ta, or W, or oxides of Al, Zr, or Hf. The method involves flowing past the whiskers at about 1025.degree.-1125.degree. C. a mixture of hydrogen and one of the following gaseous mixtures: Group I comprises one or more of Ti, Zr, Hf, Nb, Ta, or W hhalides mixed with one or more of N.sub.2, NH.sub.3, or suitable free carbon forming aliphatic hydrocarbons. The atomic ratio of carbon and/or nitrogen to metal is about 5:1-16:1, and the volume ratio of hydrocarbon and/or N.sub.2 and/or NH.sub.3 to H.sub.2 is about 1:5 to 1:20. Group II comprises one or more Al, Zr, or Hf halides mixed with one or more suitable oxygen donor gases, in proportions selected to form the desired metal oxide.

Method of coating metal carbide nitride, and carbonitride whiskers with

A chemical vapor deposition process for producing single crystal whiskers of metal carbides, nitrides, or carbonitrides involving flushing a reaction chamber including a suitable substrate surface heated to 1025.degree.-1125.degree. C., and flowing reactant gases past the substrate to form whiskers. The reactants comprise a halide of Ti, Zr, Hf, Nb, Ta or W and one or more of nitrogen, ammonia and suitable aliphatic hydrocarbons. The atomic ratio of carbon and/or nitrogen to metal is about 5:1 to 16:1; the volume ratio of hydrocarbon and/or nitrogen and/or ammonia to hydrogen is about 1:50-1:20. The preferred substrate materials are nickel or a high nickel alloy coated with TiC or TiN, or, for carbide whiskers, nickel impregnated graphite. The reactor walls and internal fixtures preferably provide the substrate surfaces. A more efficient batch process and a continuous process for whisker growth are disclosed.

Chemical vapor deposition process for producing metal carbide or nitride

The present invention is directed to a triple coated cemented hard metal carbide product in which a cemented metal carbide substrate is coated with, first, a metal carbide coating to promote coating adherence to the substrate, secondly, a metal nitride or carbonitride coating to promote crater wear resistance and, thirdly, a metal carbide outer layer to promote flank flank wear resistance in order to protect the cemented metal carbide substrate from corrosive atmosphere and abrasion due to frictional flank wear.

Coated cemented carbide cutting tool

Coated composite ceramic cutting tools and cutting tool inserts having improved mechanical and chemical wear resistance under demanding conditions of machining speed, temperature, or workpiece hardness comprise a composite silicon nitride substrate having at least one hard adherent coating of alumina. The composite silicon nitride substrate consists essentially of a first phase of silicon nitride and a refractory second phase comprising silicon nitride and an effective amount of a densification aid selected from yttrium oxide, zirconium oxide, hafnium oxide, the lanthanide rare earth oxides, and mixtures thereof.

Alumina coated composite silicon nitride cutting tools

Cutting tools and cutting tool inserts having improved mechanical and chemical wear resistance under demanding conditions of machining speed, temperature, or workpiece hardness comprise a composite silicon nitride substrate having at least one hard adherent coating layer of a refractory metal carbide. The composite silicon nitride substrate body consists essentially of particles of a refractory material uniformly distributed in a matrix consisting essentially of a first phase of silicon nitride and a refractory second phase comprising silicon nitride and an effective amount of a densification aid selected from the group consisting of yttrium oxide, hafnium oxide, the lanthanide rare earth oxides, and mixtures thereof.

Carbide coated composite silicon nitride cutting tools

Cutting tools and cutting tool inserts having improved mechanical and chemical wear resistance under demanding conditions of machining speed, temperature, or workpiece hardness comprise a composite silicon nitride substrate having at least one hard adherent coating layer of a refractory metal carbonitride. The composite silicon nitride substrate body consists essentially of particles of a refractory material uniformly distributed in a matrix consisting essentially of a first phase of silicon nitride and a refractory second phase comprising silicon nitride and an effective amount of a densification aid selected from the group consisting of yttrium oxide, hafnium oxide, the lanthanide rare earth oxides, and mixtures thereof.

Carbonitride coated composite silicon nitride cutting tools

Cutting tools and cutting tool inserts having improved mechanical and chemical wear resistance under demanding conditions of machining speed, temperature, or workpiece hardness comprise a composite silicon nitride substrate having at least one hard adherent coating layer of a refractory metal nitride. The composite silicon nitride substrate body consists essentially of particles of a refractory material uniformly distributed in a matrix consisting essentially of a first phase of silicon nitride and a refractory second phase comprising silicon nitride and an effective amount of a densification aid selected from the group consisting of yttrium oxide, hafnium oxide, the lanthanide rare earth oxides, and mixtures thereof.

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Southboro, MA, United States of America

Charles D'Angelo