Applied Materials, Inc.

Charles Chu

Patricia M Liu

Johanes F Swenberg

Malcolm J Bevan

Tatsuya E Sato

Steven C Hung

David Chu

Shih-Chung Chen

Processing methods may be performed to produce semiconductor structures that may include a high-k dielectric material. The methods may include delivering a nitrogen-containing precursor or an oxygen-containing precursor to a substrate contained in a semiconductor processing chamber. The methods may include forming reactive ligands on an exposed surface of the substrate with the nitrogen-containing precursor or the oxygen-containing precursor. The methods may also include forming a high-k dielectric material overlying the substrate.

Treatments to enhance material structures

Growing community of inventors

Santa Clara, CA, United States of America

Charles Chu