Ppg Industries, Inc.

Ppg Industries Ohio, Inc.

Charles B Friedlander

Rostyslaw Dowbenko

David A Diehl

Gerald W Gruber

Alan B Weissberg

John C McMullen

Ronald R Ambrose

Deborah E Hayes

Edward E McEntire

William H McDonald

Carolyn A Novak

Edward T Ryan

Byron M Humke

A radiation curable coating composition comprising: (A) an unsaturated polyester component; and (B) a non-polymerized, cocurable vinyl ether component. Component (B) may be separate from or structurally incorporated in the unsaturated polyester component. The vinyl ether component contains an average of at least two vinyl ether groups per molecule of the vinyl ether component.

Radiation curable compositons based on unsaturated polyesters and

A liquid, radiation curable composition is disclosed that includes a reactive diluent to lower initial application viscosity without substantial reduction of cure rate. The composition of the present invention comprises: (a) an unsaturated polyester polymer; (b) a non-polymerized, cocurable polyfunctional vinyl ether component; and (c) a reactive diluent which is an unsaturated dioic acid ester having the following structural formula: ##STR1## wherein at least one of R.sup.1 and R.sup.2 is a group that includes an oxygen with a carbon adlacent thereto and an abstractable hydrogen attached to the carbon.

Polyester and vinyl ether radiation curable compositions with reactive

Disclosed is a radiation curable composition which includes: (a) an unsaturated ester compound, and (b) a pulverizable vinyl ether compound. The unsaturated ester compound is characterized as having a plurality of unsaturated ester groups per molecule. The pulverizable vinyl ether compound is characterized as including at least one of the following: (a) a compound having an average of greater than 1.0 reactive vinyl ether groups per molecule, and (b) a vinyl ether-containing group bonded to the unsaturated ester compound such that there is an average of at least 1.0 reactive vinyl ether group per molecule. The unsaturated ester compound, the vinyl ether compound and/or a mixture thereof is treated with a reducing agent so as to decompose destabilizing agents present therein that would initiate premature polymerization of the vinyl ether compound. Accordingly, in the stabilized radiation curable coating compositions of this invention, polymerization of the vinyl ether compound is substantially avoided until blended with the unsaturated ester compound and exposed to radiation.

Stabilized radiation curable compositions based on unsaturated ester and

Disclosed is a liquid, radiation curable composition comprising: (A) an unsaturated polyester component containing an unsaturated polyester polymer, an unsaturated polyester oligomer or a mixture thereof; and (B) a non-polymerized, cocurable vinyl ether component which may be separate from or structurally incorporated in the unsaturated polyester component, provided that the vinyl ether component contains an average of at least two vinyl ether groups per molecule of the vinyl ether component. Also disclosed is a method of coating comprising: applying to a substrate a film of a liquid, radiation curable composition of the invention, and curing the composition through its thickness to a tack-free state by exposing the film to ionizing radiation and/or ultraviolet light.

Radiation curable compositions based on unsaturated polyesters and

This invention relates to 2-mercaptothiazoline-containing resinous protective compositions which can be lead-free compositions for mirror-back coatings which are useful in reducing or preventing corrosion.

Mirror protective composition comprising 2-mercaptothiazoline

Disclosed is an ungelled radiation curable resin which is a reaction product of (a) a polyfunctional hydroxyl-containing carboxylic acid having a molecular weight less than or equal to 1,000 and having a total functionality of equal to or greater than 3; (b) an organic hydroxyl-functional compound; and (c) an alpha, beta-ethylenically unsaturated carboxylic acid. Also disclosed is a radiation curable composition containing the radiation curable resin in combination with a polymer having a glass transition temperature equal to or higher than minus 17 degrees Celsius selected from an acrylic polymer and a polyester polymer. The radiation curable resins are particularly useful for coatings over non-metallic substrates such as ABS plastics, etc., having an adherent, thin film of metal deposited by vacuum metallizing, sputtering, electroless deposition, electroplating, and the like.

Radiation curable compositions based on radiation curable esters of

Radiation polymerizable acrylyloxy-containing reaction products are provided from Michael addition reaction of an amide acrylate material with a primary or secondary amine. The resulting amine adducts of the amide acrylate compounds possess high cure rates in air.

Radiation curable Michael addition amine adducts of amide acrylate

Radiation-curable coating compositions are disclosed which contain one or more amide acrylate compounds of the general formula: ##STR1## wherein X, Y and Z may each independently be H, alkyl, aryl, acrylyloxyalkyl, acrylyloxy aliphatic ester or acrylyloxy aliphatic ether, provided that X, Y and Z together have two, three or four acrylyloxy groups. The compositions are highly radiation-sensitive and very fast curing and form mar-resistant protective and decorative film coatings which are particularly useful as UV-cured overprint varnishes.

Radiation-curable coating compositions containing amide acrylate

Radiation curable compounds are disclosed comprising an amide moiety, a urethane moiety and an ethylenically unsaturated functional group, typically an acrylate functional group. This class of amide urethane acrylate compounds is characterized in having an amide moiety formed by the condensation reaction between a compound containing one or more carboxylic acid groups and an isocyanato-containing compound. Coating compositions containing one or more of these amide urethane acrylate compounds radiation polymerize at relatively high rates to provide protective and decorative films having improved wear resistance and flexibility.

Amide-modified urethane acrylate radiation curable compounds derived

Radiation curable compounds are disclosed comprising an amide moiety, a urethane moiety and an ethylenically unsaturated functional group, typically an acrylate functional group. The compounds comprise the reaction products of an amide-containing compound having at least one hydroxy functional group, a polyisocyanate and a polyfunctional compound having a hydroxy functional group reactive with an isocyanato group of the polyisocyanate, which polyfunctional compound provides an ethylenic functional group in the reaction product. Coating compositions containing these radiation curable reaction products cure at relatively high rates to form films having high abrasion resistance and improved tensile strength and elongation properties as compared to conventional urethane acrylate coating compositions.

Amide-modified urethane acrylate radiation curable compounds and coating

Radiation curable compounds are disclosed which are derived from the reaction of siloxy-containing carbinol, a polyisocyanate and a polyfunctional compound having hydroxy and acrylic functional groups. The compounds have high cure rates, are compatible with other components of radiation curable, film forming compositions and impart good slip and other properties to cured film coatings.

Siloxane urethane acrylate radiation curable compounds for use in

Urea-linked urethane-modified acrylate-capped resins provide radiation curable coating compositions of exceptional durability and flexibility and which are essentially free of volatile solvents. These resins, typically produced by controlled addition of water to an isocyanato-terminated urethane- or thiocarbamate-containing prepolymer moiety to form an intermediate which is reacted with a hydroxyl-containing acrylic monomer that furnishes ethylenic unsaturation crosslinking sites to the resin, are further characterized by the resin composition substantially comprising molecules wherein the urea group has directly adjacent radicals derived from the prepolymer moiety.

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Glenshaw, PA, United States of America

Charles B Friedlander