Other

Charlene Reaux

Steve Nelson

Dirk Maarten Knotter

Georg Gogg

A method of manufacturing an electronic device, in particular but not exclusively a semiconductor device, in which method a substrate ( ) is placed inside a process chamber ( ) and a surface ( ) of the substrate ( ) is subjected to an ozone treatment comprising the steps of: providing a liquid onto the surface ( ) of the substrate ( ) via first supply means, introducing a solution comprising a liquid carrier solvent and ozone gas into the process chamber ( ) via second supply means, without bringing about direct contact between the solution and the surface ( ) of the substrate ( ).

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Chaska, MN, United States of America

Charlene Reaux