Shenzhen China Star Optoelectronics Technology Co., Ltd.

Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.

Chaode Mo

Chunliang Lee

The present invention discloses a display device and a manufacturing method thereof, including the following steps: forming a thin-film transistor array substrate, the thin-film transistor array substrate including a first surface and a second surface that are disposed opposite to each other; forming a protective layer on the first surface; forming a metal layer on the second surface by a first patterning; forming a metal member by performing a second patterning on the metal layer; forming a patterned insulating layer on the second surface; forming an electrode layer on the metal member; forming a planarization layer on the electrode layer and the insulating layer; and removing the protective layer.

Display device and manufacturing method thereof

A thin film transistor (TFT) array substrate and a display panel are provided. The TFT array substrate has a base substrate, an anti-reflection layer, and a gate electrode insulating layer. The TFT array substrate has a light-transmitting region. The anti-reflection layer is disposed on the base substrate of the light-transmitting region. The gate electrode insulating layer is disposed on the anti-reflection layer. Light refractive indexes of the base substrate, the anti-reflection layer, and the gate electrode insulating layer are increasing sequentially.

Thin film transistor (TFT) array substrate and display panel

The present invention provides a method for manufacturing a light-shielding mask for curing a sealant, including the following steps: step: providing a transparent substrate (); step: sequentially forming a metal layer () and a photoresist layer () on the transparent substrate (); Step: carrying out exposure on an edge of the photoresist layer () to form an inspection mark (); step: subjecting the photoresist layer () to exposure along a predetermined trace by adopting an edge exposure process, wherein the predetermined trace corresponds to a predetermined trace of a sealant to be formed in a liquid crystal display panel; step: removing the exposed portion of the photoresist layer () to expose the metal layer (); step: subjecting the exposed portion of the metal layer () to etching and removing the unexposed portion of the photoresist layer (); and step: forming a transparent protection layer () on the metal layer () and the transparent substrate (). The present invention uses an edge exposure process to achieve exposure of the photoresist layer so that no specific masking plate is needed and the number of masking plates prepared can be effectively reduced, thereby reducing the cost the material for manufacture.

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Shenzhen, China

Chaode Mo