Etron Technology, Inc.

Invention and Collaboration Laboratory Pte. Ltd.

Eys3d Microelectronics, Co.

Eever Technology, Inc.

Chao-Chun Lu

Weng-Dah Ken

Chun Shiah

Bor-Doou Rong

Li-Ping Huang

Wen-Kuo Lin

Jan-Mye Sung

Chi-Feng Lee

Ming-Hua Lin

Ming-Hong Kuo

Le-Shan Hsueh

Chun-Nan Lu

A transistor structure includes a gate, a spacer, a channel region, a first concave, and a first conductive region. The gate is above a silicon surface. The spacer is above the silicon surface and at least covers a sidewall of the gate. The channel region is under the silicon surface. The first conductive region is at least partially formed in the first concave, wherein a conductive region of a neighborhood transistor structure next to the transistor structure is at least partially formed in the first concave.

Transistor structure with reduced leakage current and adjustable on/off current

A transistor structure includes a semiconductor substrate, a gate structure, a channel region, and a first conductive region. The semiconductor substrate has a semiconductor surface. The gate structure is above the semiconductor surface, and a first concave is formed to reveal the gate structure. The channel region is under the semiconductor surface. The first conductive region is electrically coupled to the channel region, and a second concave is formed to reveal the first conductive region. A mask pattern in a photolithography process is used to define the first concave, and the mask pattern only defines one dimension length of the first concave.

Transistor structure with metal interconnection directly connecting gate and drain/source regions

The present invention discloses a memory cell structure. The memory cell structure includes a silicon substrate, a transistor, and a capacitor. The silicon substrate has a silicon surface. The transistor is coupled to the silicon surface, wherein the transistor includes a gate structure, a first conductive region, and a second conductive region. The capacitor has a storage electrode, wherein the capacitor is over the transistor and the storage electrode is electrically coupled to the second conductive region of the transistor. The capacitor includes a capacitor periphery, and the transistor is located within the capacitor periphery.

Method of forming a memory cell with a transistor and a capacitor

A semiconductor memory structure includes a plurality of DRAM cells, a bit line, and a sense amplifier. Each DRAM cell includes an access transistor and a storage capacitor. The bit line has a first terminal extended along the plurality of DRAM cells to a second terminal, and the bit line is coupled to each access transistor of the plurality of DRAM cells. The sense amplifier is coupled to the first terminal of the bit line. A capacitance of the bit line per DRAM cell is lower than 20×10fF.

Semiconductor memory structure

This invention discloses sustainable DRAM with principle power supply voltage which is unified with an external logic circuit. The DRAM circuit is configured to couple with the external logic circuit and with a principle power supply voltage source. The DRAM circuit comprises a first sustaining voltage generator and a DRAM core circuit. The first sustaining voltage generator generates a first voltage level which is higher than a voltage level corresponding to a signal ONE utilized in the DRAM circuit. The DRAM core circuit has a DRAM cell comprising an access transistor and a storage capacitor, and the storage capacitor of the DRAM cell is configured to selectively coupled to the first sustaining voltage generator. Wherein, a voltage level of the principle power supply voltage source to the DRAM circuit is the same or substantially the same as that of a principle power supply voltage source to the external logic circuit.

Sustainable DRAM having principle power supply voltage unified with logic circuit

The present invention relates to DRAM with sustainable storage architecture. The DRAM comprises a DRAM cell with an access transistor and a storage capacitor, and a word line coupled to a gate terminal of the access transistor. During the period between the word line being selected to turn on the access transistor and the word line being unselected to turn off the access transistor, either a first voltage level or a second voltage level is stored in the DRAM cell, wherein the first voltage level is higher than a voltage level of a signal ONE utilized in the DRAM, and the second voltage level is lower than a voltage level of a signal ZERO utilized in the DRAM.

Dynamic memory with sustainable storage architecture

An IC system includes a package, a plurality of memory dies, and a logic chip. The plurality of memory dies are within the package, each memory die includes a memory region and abridge area, the memory region of each memory die includes a plurality of memory cells and each memory cell includes a first transistor, and the bridge area of each memory die includes a plurality of memory input/output (I/O) pads and a plurality of third transistors. The logic chip includes a logic bridge area and a plurality of second transistors, and the logic bridge area includes a plurality of logic I/O pads. Each memory die is horizontally spaced apart from the logic chip, and the plurality of memory I/O pads of each memory die are electrically coupled to the plurality of logic I/O pads. Each memory die is horizontally spaced apart from each other.

Unified micro system with memory integrated circuit and logic integrated circuit

The present invention provides a new MOSFET structure with controllable channel length by forming lightly doped drains without using ion implantation. The MOSFET structure comprises a semiconductor wafer substrate with a semiconductor surface, a gate structure over the semiconductor surface, a channel region under the semiconductor surface, and a first conductive region electrically coupled to the channel region. The first conductive region comprises a lightly doped drain region independent from the semiconductor wafer substrate.

MOSFET structure with controllable channel length by forming lightly doped drains without using ion implantation

A transistor structure includes a semiconductor substrate, a channel layer, a gate structure and a first conductive region. The semiconductor substrate includes a semiconductor surface. The channel layer is independent from the semiconductor substrate and covers the semiconductor surface. The gate structure, covers the channel layer. The first conductive region is coupled to the channel layer.

Transistor structure and processing method therefore

A semiconductor device structure includes a silicon substrate, a transistor, and an interconnection. The silicon substrate has a silicon surface. The transistor includes a gate structure, a first conductive region, a second conductive region, and a channel under the silicon surface. The interconnection is extended beyond the transistor and coupled to the first conductive region of the transistor. The interconnection is disposed under the silicon surface and isolated from the silicon substrate by an isolation region.

Method forming a semiconductor device structure having an underground interconnection embedded into a silicon substrate

A transistor structure includes a gate conductive region, a gate dielectric region, a channel region and a drain region. The gate conductive region is below an original surface of a substrate. The gate dielectric region surrounds the gate conductive region. The channel region surrounds the gate dielectric region. The drain region is horizontally spaced apart from the gate conductive region, wherein the drain region includes a highly doped region; wherein the gate dielectric region includes a first dielectric portion and a second dielectric portion, the first dielectric portion is positioned between the gate conductive region and the highly doped region, and the second dielectric portion is positioned between the gate conductive region and the channel region; wherein a horizontal thickness of the first dielectric portion is greater than that of the second dielectric portion.

Transistor structure with increased gate dielectric thickness between gate-to-drain overlap region

A memory cell structure includes a silicon substrate, a transistor, a bit line, and a capacitor. The silicon substrate has a silicon surface. The transistor is coupled to the silicon surface, wherein the transistor includes a gate structure, a first conductive region, and a second conductive region. The bit line is electrically coupled to the first conductive region of the transistor and positioned under the silicon surface. The capacitor is over the transistor and electrically coupled to the second conductive region of the transistor.

Memory cell structure with capacitor over transistor

A transistor structure includes a semiconductor substrate, agate structure, a channel region, and a first conductive region. The semiconductor substrate has a semiconductor surface. The channel region includes a first terminal and a second terminal. The first conductive region is electrically coupled to the first terminal of the channel region, and the first conductive region includes a first metal containing region under the semiconductor surface.

Transistor structure and related inverter

The invention relates to DRAM with sustainable storage architecture. The DRAM comprises a first supplying voltage source generating a voltage level corresponding to signal ONE utilized in the DRAM chip, and a DRAM cell which includes an access transistor and a storage capacitor. Wherein a first voltage level is higher than the voltage level corresponding to signal ONE, and the first voltage level is generated by a first sustaining voltage generator. The first sustaining voltage generator is electrically coupled to the storage capacitor of the DRAM cell during a turning-off period of the access transistor of the DRAM cell. A clean up circuit is provided to mitigate the difference between the voltages of BL/BLB and the targeted reference voltage during the equalization period.

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Taipei, Taiwan

Chao-Chun Lu