Asml Netherlands B.v.

Chanpreet Kaur

Johannes Jacobus Matheus Baselmans

James Robert Downes

Roland Johannes Wilhelmus Stas

Giovanni Imponente

Nico Vanroose

Pieter Bart Aloïs De Buck

A method comprising illuminating a patterning device (MA') comprising a plurality of patterned regions (-) of which each patterns a measurement beam (-), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus () comprising a plurality of detector regions (-), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

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Eindhoven, Netherlands

Chanpreet Kaur