Samsung Electronics Co., Ltd.

Chanhee Jeon

Sukjin Kim

Jin Seong Heo

ChangSu Kim

Mijin Lee

Eunkyoung Kwon

Bongjae Kwon

Minho Kim

Eonguk Kim

Jaehyun Yoo

Namho Kim

Jooyoung Song

Jongkyu Song

Sangyoung Cho

Hyunkwang Jeong

Sungjun Song

Jangkyu Choi

An electrostatic discharge clamp circuit includes a resistor connected between a first node and a second node, a first capacitor connected between the second node and a third node, a second capacitor connected between a fourth node and the third node, a third capacitor connected between a fifth node and the third node, a first inverter providing a power supply voltage or a voltage of the fourth node based on a voltage of the second node, a second inverter providing an output voltage of the first inverter or a voltage of the fifth node based on the voltage of the fourth node, a third inverter configured to provide an output voltage of the second inverter or the ground voltage based on the voltage of the fifth node.

Electrostatic discharge clamp circuit

A semiconductor device is provided. The semiconductor device includes: a first power pad; a second power pad; a signal pad; a clamping circuit connected between the first power pad and the second power pad; a driving circuit connected to the signal pad and including a pull-up circuit and a pull-down circuit; and a first gate-off circuit connected to the pull-down circuit. The first gate-off circuit is configured to connect a gate of the pull-down circuit and a source of the pull-down circuit to each other during an electrostatic discharge (ESD) event in which a high voltage is applied to the signal pad, and control a current generated by the high voltage to flow to the clamping circuit.

Semiconductor device

An electrostatic discharge protection device includes: an emitter region disposed on a semiconductor substrate; a base region surrounding the emitter region; a first collector region surrounding the base region; a second collector region surrounding the first collector region; a second conductivity-type drift region below the emitter region, and being deeper than the base region; a second conductivity-type well region disposed below the base region, and having a junction interface with the second conductivity-type drift region; and a plurality of isolation portions disposed between the emitter region, the base region, and the first collector region and the second collector region.

Electrostatic discharge protection device

A semiconductor device includes a substrate including a P-well region, a gate electrode on the substrate, and a first region and a second region formed in the substrate on opposite sides adjacent to the gate electrode, the first region includes a first N-well region in the substrate and a second N-well region, a first impurity region, a second impurity region in the first N-well region, the second region includes a third impurity region in the substrate and a fourth impurity region in the third impurity region, a doping concentration of the second N-well region is greater than a doping concentration of the first N-well region, and a doping concentration of the second impurity region is greater than a doping concentration of the second N-well region.

Electrostatic discharge protection element and semiconductor devices including the same

An electrostatic discharge (ESD) device having a small size, a low turn-on voltage, and a low on resistance and an ESD protection circuit including the ESD device are provided. The ESD device includes a well formed in a substrate to have a first conductive type, an active region being defined at an upper portion of the substrate, a plurality of fins extending in a first direction to have a structure protruding from the substrate, a first conductive impurity region formed with first conductive impurities, a second conductive impurity region formed with second conductive impurities, and a fin-cut isolation region disposed between the first conductive impurity region and the second conductive impurity region in the first direction to cut each fin, wherein a bottom surface of the fin-cut isolation region is higher than a bottom surface of the active region.

FinFET ESD device with fin-cut isolation region

A semiconductor device includes first well regions in a substrate and spaced apart from each other, a connection doped region between the first well regions, and a first interconnection line electrically connected to the connection doped region through a first contact. The first well regions and the connection doped region include impurities of a first conductivity type, and a concentration of the impurities in the connection doped region is higher than that in the first well regions. The first well regions extend into the substrate to a depth larger than that of the connection doped region. A first portion of the connection doped region is disposed in the first well regions and a second portion of the connection doped region contacts the substrate.

A buffer circuit includes pull up and pull down circuits configured to selectively pull up and pull down, respectively, a voltage of an input/output pad. The pull up and pull down circuits are connected to separate power supply lines such that a current path from the input/output pad to the pull down circuit through the pull up circuit does not exist when electrostatic discharge is received at the input/output pad.

Buffer circuit having electrostatic discharge protection

The buffer circuit includes pull up and pull down circuits configured to selectively pull up and pull down, respectively, a voltage of an put/output pad. The pull up and pull down circuits are connected to separate power supply lines such that a current path from the input/output pad to the pull down circuit through the pull up circuit does not exist when electrostatic discharge is received at the input/output pad.

Growing community of inventors

Suwon-si, South Korea

Chanhee Jeon