Samsung Electro-mechanics Co., Ltd.

Samsung Electronics Co., Ltd.

Changsung Sean Kim

Han Kyung Bae

Chang Hwan Choi

Jong Pa Hong

Sang Jin Kim

Guen Hong Lee

Suk Ho Song

Kyung Ho Lee

Ji Hye Shim

Jin Su Seok

Yong Wan Cho

Sang Duk Yoo

Jin Wook Baek

Hong Chul Shin

Se Yeun Hwang

Joong El Kim

Won Shin Lee

Jang Hyeok Won

Disclosed herein are an apparatus and a method for diagnosing a fault of a multi-sensor of a motor. The apparatus includes: a plurality of tachometers attached to the motor to measure rotation speeds; and a plurality of processors each connected directly to the plurality of tachometers to receive the measured rotation speeds, thereby securing a plurality of directly obtained rotation speeds, sharing the obtained rotation speeds with each other, thereby obtaining a plurality of indirectly obtained rotation speeds, and performing a fault diagnosis on the plurality of tachometers using the plurality of directly obtained rotation speeds and the plurality of indirectly obtained rotation speeds.

Apparatus and method for diagnosing fault of multi-sensor of motor

There is provided a micro-ejector. The micro-ejector according to an exemplary embodiment of the present invention may include an ejection device including a passage for ejecting fluid contained therein, and a piezoelectric actuator providing a driving force for ejecting fluid, a mounting plate including a passage for providing fluid to the ejection device formed therein, and a mounting groove on which the ejection device is mounted, and a connection member formed on the mounting plate, and adopted for connecting the piezoelectric actuator to an external power source.

Micro-ejector

There are provided a micro-ejector and a method for manufacturing the same. The micro-ejector according to the present invention includes a passage plate including a barrier rib portion disposed in an upper space in a chamber and a protruding portion disposed in a lower space in the chamber and forming a passage in the same direction as a fluid discharging direction together with the barrier rib portion; and an actuator formed on the upper portion of the passage plate to correspond to the chamber and providing a driving force of discharging the fluid to the nozzle from the chamber.

Micro-ejector and method for manufacturing the same

Disclosed herein is a switched reluctance motor having a double rotor structure. An outer stator salient pole corresponding to an outer rotor salient pole is formed to have an 'E' shape by sequentially disposing a main salient pole, a first auxiliary salient pole, and a second auxiliary salient pole and an inner stator salient pole corresponding to an inner rotor salient pole is formed to have a pi (&#x3c0;) shape by sequentially disposing a first salient pole and a second salient pole, such that a magnetic flux path is reduced, thereby making it possible to prevent the loss of magnetic force.

Switched reluctance motor

An apparatus is provided for driving wheels for an in-wheel system, including: a driving shaft which is the center of rotatable driving; a fixation supporter rotatably supporting the driving shaft and coupled to the driving shaft; an in-wheel motor generating rotational power, which is coupled to the inside of a wheel in which a tire is mounted on one driving shaft in a shaft direction of the fixation supporter; and a balancing member formed on the other driving shaft in the shaft direction of the fixation supporter and formed at a position corresponding to the wheel coupled with the in-wheel motor. According to the present invention, an eccentricity phenomenon which is caused due to inclination of a wheel and a motor in one direction of a fixation supporter can he prevented in an apparatus of driving wheels for an in-wheel system.

Apparatus of driving wheels for in-wheel system

A showerhead for chemical vapor deposition (CVD) includes a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber, and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head.

Showerhead for chemical vapor deposition and chemical vapor deposition apparatus having the same

Provided is a chemical vapor deposition apparatus. The apparatus includes a reaction chamber, a gas introduction unit, and a gas exhaust unit. The reaction chamber includes a susceptor on which a wafer is loaded and a reaction furnace in which the wafer is processed by chemical vapor deposition. The gas introduction unit is disposed at an outer wall of the reaction chamber to supply reaction gas from an outside of the reaction furnace to a center portion of the reaction furnace. The gas exhaust unit is disposed at a center portion of the reaction chamber to discharge the reaction gas to an upper or lower outside of the reaction chamber after the reaction gas is used for a reaction in the reaction furnace. Therefore, the gas density inside the chamber can be kept at a substantially uniform state even when process pressure is increased for growing a high-temperature deposition layer.

Chemical vapor deposition apparatus

There is provided a chemical vapor deposition apparatus improved in structure such that a reaction gas introduced into a reactor where deposition is performed flows at a substantially uniform rate to ensure a thin film is grown substantially uniformly on the deposition object. The chemical vapor deposition apparatus includes: a chamber; a reactor provided in the chamber to have a deposition object deposited therein; and a reservoir storing a reaction gas fed from the outside to introduce the reaction gas to the reactor, the reservoir having a cross-sectional area changing according to a flow path of the introduced reaction gas.

Growing community of inventors

Gyunggi-do, South Korea

Changsung Sean Kim