Samsung Electronics Co., Ltd.

Changhoon Choi

Myungjun Lee

Wookrae Kim

Gwangsik Park

Jung-pil Yu

Jung-hyun Park

Sung-kyu Jung

Jihoon Na

An EUV photomask inspection apparatus includes a plurality of optical systems respectively forming different confocal points in a mask structure including an EUV photomask and a pellicle on the EUV photomask. A first optical system among the plurality of optical systems includes a first light source emitting first light having a wavelength in a visible light range, a beam splitter transmitting or reflecting the first light, an objective lens configured to allow the first light to pass through at least a portion of the mask structure to form a first focus in the mask structure, a first light detector configured to detect first reflected light reflected from the mask structure by the incident first light, and a pinhole plate in front of the first light source. The first light detector includes a detection module including a PMT and an APD, and a thermoelectric cooling module.

EUV photomask inspection apparatus

A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.

Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM

A receiving apparatus includes: a first decoder configured to decode a signal transmitted through a first layer from a layered division multiplexing (LDM) signal using a parity check matrix to generate low density parity check (LDPC) information word bits and parity bits; an encoder configured to encode the LDPC information word bits, generated by decoding the signal transmitted through the first layer, using the parity check matrix to generate parity bits corresponding only to preset columns in the parity check matrix; and a second decoder configured to decode a signal obtained by removing, from the LDM signal, a signal corresponding to the LDPC information word bits generated by decoding the signal transmitted through the first layer, the parity bits generated by the encoder, and the parity bits generated by the first decoder except the parity bits generated by the encoder, thereby to generate information word bits transmitted through a second layer.

Receiving apparatus and decoding method thereof

Growing community of inventors

Hwaseong-si, South Korea

Changhoon Choi