Lg Chem, Ltd

Changho Cho

Han Soo Kim

Sunhwa Kim

Yoon Hee Heo

Won Jin Chung

Sunghyun Kim

Raisa Kharbash

Dongchang Choi

Sang Chul Lee

Jongho Park

Kwang Han Park

Hye Jin Park

Ho Chan Ji

The present invention relates to an alkali soluble, photo-curable and thermo-curable copolymer containing three types of (meth)acrylate repeating units classified by the type of functional groups present at the terminal, and a photosensitive resin composition, a photosensitive resin film, and a color filter using the same.

Alkali soluble, photo-curable and thermo-curable copolymer, and photosensitive resin composition, photosensitive resin film and color filter using the same

The present application relates to a photoactive compound including an oxime ester group and a phosphonate group together, and a photosensitive resin composition comprising the same, the compound of the present application having excellent storage stability and high-temperature process characteristics.

Photoactive compound and light-sensitive resin composition comprising same

The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.

Photoactive compound and photosensitive resin composition comprising the same

The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

Polymer and photosensitive resin composition comprising the same

The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.

Fluorene-based resin polymer and photo-sensitive resin composition comprising the same

The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.

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Anseong-si, South Korea

Changho Cho