Asml Netherlands B.v.

Chang-Wei Chen

Wim Tjibbo Tel

Cédric Désiré Grouwstra

Sarathi Roy

Weitian Kou

Manouk Rijpstra

Pieter Gerardus Jacobus Smorenberg

Cornelis Johannes Henricus Lambregts

Chi-Fei Nien

A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Computational metrology based correction and control

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Taipei, Taiwan

Chang-Wei Chen