Samsung Display Co., Ltd.

Chang Uk An

Jai Phoong Kim

Jae Hoon Lee

Jae Min Hong

Hyuk Kang

Byung Jin Choi

Han Geul Lim

A mask cleaning apparatus includes a cleaning bath including an accommodating space in which a cleaning solution is stored, a transfer robot transferring a mask, and an induction heating member disposed inside the accommodating space. The cleaning bath includes at least one side and a bottom surface, which define the accommodating space. The induction heating member includes a first heating member, a second heating member, and a waterproof layer covering the first heating member and the second heating member.

Apparatus for cleaning mask

Provided are a deposition mask cleaning apparatus and a deposition mask cleaning method. The deposition mask cleaning apparatus includes a treated water bath containing treated water in which a deposition mask is immersed; a treated water generation part supplying the treated water to the treated water bath; a treated water supply pipe connecting the treated water bath and the treated water generation part; and a bubble generation part disposed in the treated water supply pipe and generating bubbles in the treated water. The treated water includes at least one of ozone water, hydrogen water, ammonia hydrogen water, and carbonated water. The bubbles include at least one of microbubbles having a bubble diameter of about 50 μm or less and nanobubbles having a bubble diameter of about 1 μm or less.

Deposition mask cleaning apparatus and deposition mask cleaning method

Growing community of inventors

Cheonan-si, South Korea

Chang Uk An