Korea Electrotechnology Research Institute

Chang Rin Lee

Jeong Woo Jeon

Sung Il Chung

Hyeon Taeg Kim

Hyeon Seok Oh

Jong Moon Kim

Mitica Caraiani

Hyun Seok Oh

The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.

Cylindrical magnetic levitation stage and lithography

Growing community of inventors

Gyeongsangnam-do, South Korea

Chang Rin Lee