Applied Materials, Inc.

Chang-Lin (Peter) Hsieh

Gerardo Delgadino

Yifeng Zhou

A plasma etch process includes a plasma etch step performed with a photoresist mask on a workpiece using a polymerizing etch process gas that produces in the plasma polymerizing species which accumulate as a protective polymer layer on the surface of said photoresist mask during the etch step, the process including the following steps performed in the same chamber after the etch step and prior to removing the photoresist mask:

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San Jose, CA, United States of America

Chang-Lin (Peter) Hsieh