Samsung Electronics Co., Ltd.

Inha-industry Partnership Institute

Chang-kwon Hwangbo

Yong-hwa Park

Jin-joo Kim

Yong-Ho Lee

Jang-woo You

Ji-deog Kim

Sung-min Huh

Yong-jun Park

Hee-young Kang

Byoung-Sup Ahn

Jang-hoon Lee

A photonic crystal type light modulator is provided. The photonic crystal type light modulator includes: a substrate; a first electrode disposed on the substrate; an active layer disposed on the first electrode, where an optical characteristic of the active layer changes according to application of an electric field; a second electrode disposed on the active layer; and a photonic crystal layer disposed on the second electrode and comprising a 2D grating.

Photonic crystal type light modulator and 3D image acquisition apparatus employing the same

Provided are a high-speed optical modulator and a method of modulating light by using the same. The optical modulator includes first and second resonance cavities that are sequentially stacked on a transparent substrate, wherein the first and second resonance cavities each include an electric-optical layer. According to the method, first and second voltages having different sizes are simultaneously applied respectively to the first and second resonance cavities, and then for the other configuration of the modulator mutually interchanged voltages are applied.

High-speed optical modulator and method of modulating light by using the same

A reflective photomask and a method of determining or optimizing thicknesses of layers of the reflective photomask are provided. The reflective photomask may include a substrate, a reflective layer, an absorptive pattern, and a spacer. The substrate may include a reflective region and an absorptive region, the reflective layer may be formed between the reflective and absorptive regions, the absorptive pattern may be formed on the reflective layer corresponding to the reflective region, and the spacer may be formed at an upper portion, lower portion, or inside of the reflective layer so as to correspond to the reflective region.

Reflective photomasks and methods of determining layer thicknesses of the same

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Incheon, South Korea

Chang-kwon Hwangbo