Agency for Science, Technology and Research

Chang Kuo Chang

My The Doan

Vladimir Bliznetsov

Ramana Murthy Badam

Chi Fo Tsang

Formation, through etching, of structures whose minimum width is less than can be achieved by optical means alone has been achieved by inserting a layer of sandwiching material between the photoresist (or hard mask if used) and the structure. By adjustment of the relative etch rates of this layer and the structure, a uniform lateral width reduction and surface smoothing of the structure is achieved.

Growing community of inventors

Singapore, Singapore

Chang Kuo Chang