Lg Electronics Inc.

Hyundai Electronics Industries Co. Ltd.

Lg Semicon Co., Ltd.

Chang Jae Kim

Hyun Jae Lee

Seung Geun Lim

Kyoung Yong Kim

In Jae Park

Tae Wha Choi

Sang Min Park

Hyun Sup Lee

Sung Hee Han

Da Na Jung

Dong Hyun Kang

Young Tae Im

Jong Woo Yoon

Seung Yoon Yang

Jong Sik Kim

Tanigawa Eiki

Seong Jae Park

A mobile terminal includes a front housing made of a light-transmitting material and provided with edge parts, at least one of which is rounded or bent to be inclined which causes optical illusions so as to provide visual mystique. A display unit is provided under the front housing. A circuit substrate is provided under the display unit. A rear housing is provided to accommodate the display unit and the circuit substrate together with the front housing. A middle housing is provided between the front housing and the rear housing. The middle housing includes a receipt part to accommodate the display unit, and boundary parts connecting the receipt part and edge parts of the middle housing and disposed under the edge parts of the front housing. The edge part of the middle housing is protruded from the boundary part of the middle housing in a horizontal direction.

Mobile terminal

A mobile terminal is disclosed, by which a user is facilitated to carry and use a terminal in a simple and easy way. According to the present invention, since a camera module is configured in a manner that a protective cover is provided not to a case but to a module body, it is advantageous in protecting a lens unit provided to the module body before installing the camera module at the case. While light passes through a protective cover, a protective cover physically isolates an inside of a camera module from an outside to prevent external particles from being introduced into the camera module. Therefore, it is advantageous in enhancing durability of the camera module. A loading portion is provided to a case to guide an installation position of a camera module. A separate cover is not added to the case. And, a protective cover of a camera module is directly exposed to outside. Therefore, accumulation of numerical value tolerance is barely generated and an assembly process is simplified.

A gas injection system for a chemical vapor deposition device includes a gas providing pipe providing gases into the system, a shower head unit coupled to the gas providing pipe for evenly injecting the gases on a wafer, and a temperature control unit coupled to the shower head unit for controlling a temperature of the shower head unit.

Gas injection system for chemical vapor deposition device

A fluid heater for a semiconductor device is provided to uniformly heat a gas, for thereby improving uniformity and speed of gas reaction and thus increasing the yield of semiconductor device fabrication. The fluid heater includes a main heater of a helical shape formed of a thermal conductor having various radii; a transparent tube, in which the main heater is located, having a plurality of holes at a lower portion thereof; an internal vessel disposed at an outer side of the transparent tube and having a plurality of holes at an upper portion thereof; an external vessel located at an outer side of the internal vessel; flanges placed on the external vessel, the internal vessel and the transparent tube and connecting a fluid inflow tube and the transparent tube and an external heater disposed at an outer wall of the external vessel. Here, the main heater is fabricated in a helical shape which has various radii, so that the fluid is evenly heated by a vortex generated by which the fluid passes through the main heater and also the fluid is heated by direct contact with the heater, thereby having an effect of increasing a temperature of the fluid up to a sufficiently high temperature, for example, a temperature above 600.degree. C.

Fluid heater for semiconductor device

A heating apparatus for chemical vapor deposition equipment which is capable of providing a uniform temperature distribution, even for a wafer having a large surface area. The heating apparatus may include upper and lower reflection plates, with a heater located between the reflection plates. The apparatus may also include a barrier plate to help provide a uniform heat distribution and to minimize dust generation and metallic pollution on a wafer. The apparatus may also include a heater cover for covering the upper portions of the first reflection plate, the heater and the barrier plate, and the sides thereof. The upper reflection plate, which is installed above the heater cover, may be integrally formed with a gas spraying means.

Heating apparatus for chemical vapor deposition equipment

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Seoul, South Korea

Chang Jae Kim