Skhynix Inc.

Chang Hwi Lee

Jin Woo Kim

Seung Yeop Lee

Man Ho Seung

Hyun Duck Lee

Ki Ryong Jung

Sung Bae Kim

Min Cheol Kim

Mi Ran Kim

Ju Hyeong Lee

Hee Jeong Son

Si Woo Lee

The test circuit monitoring positive bias temperature instability (PBTI) includes a PBTI monitoring unit driven according to a power voltage, the PBTI monitoring unit outputting an output voltage having a potential that is equal to or lower than a potential of the power voltage according to a PBTI degradation rate of an NMOS transistor; and a degradation determiner for determining the PBTI degradation rate by comparing the potential of the output voltage to the potential of the power voltage.

Test circuit monitoring PBTI and operating method thereof

A test device is disclosed. The test device includes an input/output (I/O) circuit configured to allow static electricity flowing between an input/output (I/O) pad and an internal circuit to be discharged to a power-supply line, a ground line, or a substrate line, a capacitor circuit configured to perform modeling of parasitic capacitance extracted from a package design, and a discharge circuit configured to allow capacitance stored in the capacitor circuit to be discharged to the substrate line.

Test device

A semiconductor integrated circuit device may include a pad, a first voltage protection circuit and a second voltage protection circuit. The first voltage protection circuit may be connected with the pad. The second voltage protecting circuit may be connected between the first voltage protection circuit and a ground terminal. The first voltage protection circuit may include a gate positive p-channel metal oxide semiconductor (GPPMOS) transistor. The second voltage protection circuit may include serially connected GPPMOS transistors.

Semiconductor integrated circuit device including an electro-static discharge protection circuit

A semiconductor integrated circuit device may include a pad, a first voltage protection unit and a second voltage protection unit. The first voltage protection unit may be connected with the pad. The first voltage protection unit may be configured to maintain a turn-off state when a test voltage having a negative level may be applied from the pad. The second voltage protection unit may be connected between the first voltage protection unit and a ground terminal. The second voltage protection unit may be turned-on when an electrostatic voltage having a positive level may be applied from the pad. The second voltage protection unit may include a plurality of gate positive p-channel metal oxide semiconductor (GPPMOS) transistors serially connected with each other.

Semiconductor integrated circuit device including an electrostatic discharge protection circuit

A current level extraction method for preventing cutoff is disclosed. The method may include starting a voltage sweep to an interconnection structure at a certain temperature, measuring an initial resistance of the interconnection structure, calculating a measured resistance of the interconnection structure according to a corresponding input voltage, determining whether or not a resistance ratio of the measured resistance of the interconnection structure to the initial resistance is equal to or less than a preset value, updating a current value corresponding to measured resistance to a potential maximum current level and repeating the step of calculating the measured resistance when the resistance ratio of the interconnection structure is equal to or less than the preset value, and setting the current value corresponding to the measured resistance as a maximum current level when the resistance ratio of the interconnection structure is greater than the preset value.

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Seoul, South Korea

Chang Hwi Lee