Samsung Display Co., Ltd.

Chang-Hoon Kim

Hi-Kuk Lee

Ki-beom Lee

Hong-Suk Yoo

Jae-Hyuk Chang

Jung-In Park

Sang-Hyun Yun

Bo-Kyoung Ahn

Kab-Jong Seo

Gug-Rae Jo

Hyun-Seok Kim

Sang-Hyun Lee

Min-Uk Kim

Jun-Ho Sim

Jung-Chul Heo

Jae-Hong Kim

Yu-Gwang Jeong

Sang-Gab Kim

Shin-Il Choi

Joo-han Kim

Ji-Young Park

Hee-Joon Kim

Dong-Ju Yang

Yeo-Geon Yoon

Yun-Jong Yeo

Ki-Yeup Lee

Su-Yeon Sim

Ki-Yong Song

Sung-Hen Cho

Hoon Jong Kang

Bo-Sung Kim

Kyu-Young Kim

Joo-Han Bae

Cha-Dong Kim

Woo-Yong Sung

Ju-Han Bae

Jae-Young Jang

Seon-Pil Jang

Nam-Ok Jung

Sang-Don Jang

Youn-Gu Lee

Tsunemitsu Torigoe

Byoung-Min Yun

Sang-Hyn Lee

Jong-Joo Kim

A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.

Maskless exposure method and a maskless exposure device for performing the exposure method

A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method

An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Exposure apparatus and method thereof

A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.

Contact portion of wire and manufacturing method thereof

A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer

Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.

Exposure apparatus and exposure method using the same

An exposure apparatus includes a light source, a mask and a blind. The light source is disposed over a substrate. The light source cyclically radiates light. The mask is disposed between the light source and the substrate. The mask includes an exposure region and a peripheral region. The peripheral region surrounds the exposure region. A pattern is formed in the exposure region. A plurality of first alignment marks is disposed in the peripheral region. The blind is disposed between the light source and the mask. The blind includes a blocking plate and an adjusting part. The blocking part may move across the substrate. The blocking plate includes second alignment marks disposed at end portions of the blocking plate, opposite to each other. The adjusting part adjusts a position of the blocking plate.

Blind, exposure apparatus having the blind and method of driving the exposure apparatus

An exposure apparatus includes a light source, a mask, a blind, and a blind driver. The light source emits light in a light emitting cycle. The mask is disposed over a substrate and includes an exposure window. A pattern is formed in the exposure window. The blind is disposed over the exposure window. The blind moves in a first direction to block a non-exposed area in the substrate. The blind is returned to pass through the exposure window area in a second direction opposite to the first direction. The blind includes a plurality of blocking plates. The blocking plates include a blocking portion and an opening portion. The blind driver drives the blind.

Exposure apparatus having blind and method of driving

Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

Photoresist composition and method of forming a color filter using the same

An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.

Exposure apparatus including light blocking member with light condensing part

A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.

Photoresist composition and method of forming a black matrix using the same

An exposure apparatus includes a mask, a substrate which passes through a region disposed below the mask while moving in a first direction, a light source unit disposed above the mask, where the light source irradiates light on the substrate through the mask, and at least one blind disposed below the light source unit, where the blind blocks the light irradiated from the light source unit, where a second direction is perpendicular to the first direction in a same plane as the first direction, the blind is a polyhedron having a width, a length and a thickness and is disposed such that a direction of the length is substantially parallel to the second direction, and the blind is rotatable around a rotation axis substantially parallel to the second direction, and where the width is greater than the thickness.

Exposure apparatus, exposure method, and blind for exposure apparatus

A method of manufacturing a liquid crystal display includes forming a gate line, a data line and a switching element on a first substrate including a pixel area, the switching element including a source electrode and drain electrode, forming a color filter and a conductive contact element on the source electrode of the switching element by a gravure printing method, forming a pixel electrode on the conductive contact element and on the color filter, forming a second substrate including a common electrode, and interposing a liquid crystal layer between the first substrate and the second substrate.

Liquid crystal display device and method for manufacturing the same

Growing community of inventors

Asan-si, South Korea

Chang-Hoon Kim