Samsung Electronics Co., Ltd.

Chang Gil Ryu

Jeong Min Na

Ja Eung Koo

Young Seok Jang

Hyeon Dong Song

Jin Suk Hong

Kuen Byul Kim

Eun Seok Lee

A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.

Polishing pad conditioning apparatus

Growing community of inventors

Yongin-si, South Korea

Chang Gil Ryu