Unimicron Technology Corporation

Unimicron Taiwan Corp.

World Wiser Electrics Inc.

Chang-Chin Hsieh

Jao-Chin Cheng

Chih-Peng Fan

Chung-Yuan Chiu

Chih-Hao Yeh

Bang-Chiung Liu

Chin-Chung Chang

A method of forming a solid inter-layer conductive rod. A printed circuit board comprising an insulating core layer, a first conductive layer and a second conductive layer is provided. The insulating core layer is sandwiched between the first conductive layer and the second conductive layer. A first opening that exposes a portion of the insulating core layer is formed in the first conductive layer. The exposed insulating core layer is removed by laser drilling to form a second opening that exposes a portion of the second conductive layer. An electroplating process is conducted using the second conductive layer as a negative electrode so that conductive material solidly fills the first opening and the second opening to form a solid conductive rod.

Method of fabricating inter-layer solid conductive rods

A method of producing an external connector is provided. A substrate is provided and a plurality of pads are formed on the substrate. A copper layer is formed on the substrate to cover the pads. A patterned photoresist is formed on the copper layer. The patterned photoresist has a plurality of openings to expose the copper layer which corresponds to the pads. Then, a conductive plug is formed on the exposed copper layer. The patterned photoresist is removed, and the copper layer which is not covered by the conductive plug is subsequently removed. A solder resist is formed over the substrate to cover the pads and the conductive plug. A portion of the solder resist is removed until the conductive plug is exposed, wherein the solder resist is as high as the conductive plug.

Method of producing external connector for substrate

A method of forming a micro-via, for fabrication and design of a layout of a circuit board. A patterned conductive wiring layer is formed on the substrate. A copper layer is plated onto the substrate and the conductive wiring layer. A photoresist layer is formed on the copper layer. A part of the photoresist layer is removed to expose a part of the copper layer. Using the copper layer as a seed layer, a conductive pillar is formed on the exposed part of the copper layer. The photoresist layer is removed. The exposed plated copper layer is removed. An insulation layer is formed on surfaces of the substrate and the conductive pillar. A part of the insulation layer is removed to expose the conductive pillar. A patterned conductive wiring layer is formed on the conductive pillar.

Method of forming micro-via

Growing community of inventors

Taipei, Taiwan

Chang-Chin Hsieh