Lg Chem, Ltd

Chang Bum Ko

Young-Min Kim

Young Jun Hong

Seung Beom Cho

Jung Hee Lee

Dong Jo Ryu

Seung-Beom Cho

Jong Pil Kim

Gi Ra Yi

Hyo Min Kim

Kwang Ik Moon

Imgyu Kim

Soon Ho Jang

Ok Sun Kim

MinAh Kang

Im Gyu Kim

Young Sam Kim

Jung Sup Han

Jung-Hee Lee

Gi-Ra Yi

Soon-Ho Jang

Kwang-Ik Moon

The present disclosure relates to a cement additive composition including a polycarboxylic acid-based copolymer. When the cement additive composition of the present disclosure is used for cement formulation, it may improve fluidity of the composition even in a high water reducing ratio range of the particle and effectively prevent slump loss of the cement formulation, while improving initial dispersibility due to excellent water reducing performance.

Cement additive composition comprising polycarboxylic acid-based copolymer

The present disclosure relates to a preparation method for an acrylic acid-based polymer. According to the preparation method for an acrylic acid-based polymer of the present disclosure, unreacted monomers may be reduced and a high quality acrylic acid-based polymer can be prepared. In addition, it is not necessary to increase the time or the temperature in the polymerization step or the aging step, thereby maintaining the high productivity.

Preparation method for acrylic acid-based polymer

Disclosed are a cement composition additive with improved compressive strength and workability, including a polycarboxylic acid copolymer and/or a salt thereof, zinc oxide particles, and a predetermined amount of gluconic acid and/or a salt thereof, and a cement composition containing the same.

Cement composition additive containing polycarboxylic acid copolymer, zinc oxide particles and gluconate

Provided is a binder for secondary battery electrodes comprising polymer particles obtained by polymerizing three or more kinds of monomers wherein the polymer particles have a mean particle diameter of 0.3 &#x3bc;m to 0.7 &#x3bc;m. The binder exhibits superior adhesion force to electrode current collectors and excellent support force to the active material and basically improves safety of electrodes, thus providing a secondary battery with superior cycle characteristics.

Binder for secondary battery exhibiting excellent adhesion force

Disclosed are an additive of a cement composition including a cross-linked polycarboxylic copolymer and a cement composition including the same. More particularly, an additive of a cement composition including a polycarboxylic copolymer and/or a salt thereof, wherein the polycarboxylic copolymer is a copolymer of a monomer mixture including an alkoxy polyalkylene glycol mono(meth)acrylic acid ester-based monomer, a (meth)acrylic acid-based monomer, and a cross-linking agent containing 5 to 20 alkylene oxide groups and having two or more acrylate groups or vinyl groups, and a cement composition including the same are disclosed. The additive of the cement composition including the polycarboxylic copolymer according to the present invention controls a cross-linked structure and thereby initial sensitivity and retentivity are improved, and, accordingly, a cement composition having superior long-term workability may be formed.

Additive including cross-linked polycarboxylic copolymer and cement composition comprising the same

Provided is a binder for secondary battery electrodes comprising a polymer obtained by polymerizing three or more kinds of monomers with a reactive emulsifying agent. The binder reduces moisture impregnation, improves dispersibility and enhances adhesive force, thus providing a secondary battery with superior safety and cycle characteristics.

Disclosed are an additive for cement compositions that includes a polycarboxylic copolymer and a cement composition including the same and, more particularly, an additive for cement compositions that includes a polycarboxylic copolymer and/or a salt thereof, wherein the polycarboxylic copolymer is a copolymer of a monomer mixture including an alkoxy polyalkylene glycol mono(meth)acrylic acid ester-based monomer, a (meth)acrylic acid-based monomer, a (meth)acrylic acid ester-based monomer, and a polyoxyalkylene alkenyl ether sulfate salt and a cement composition including the same.

Additive including polycarboxylic copolymer and cement composition comprising the same

Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000&#x2dc;50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000&#x2dc;20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.

Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same

Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms an adsorption layer on the cationically charged material in order to increase polishing selectivity of the anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000&#x2dc;50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000&#x2dc;20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.

Disclosed is an adjuvant for controlling polishing selectivity when polishing a cationically charged material simultaneously with an anionically charged material. CMP slurry comprising the adjuvant is also disclosed. The adjuvant comprises: (a) a polyelectrolyte that forms an adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material; (b) a basic material; and (c) a fluorine-based compound. when the adjuvant for controlling polishing selectivity of CMP slurry according to the present invention is applied to a CMP process, it is possible to increase the polishing selectivity of a silicon oxide layer, to obtain a uniform particle size of CMP slurry, to stabilize variations in viscosity under an external force and to minimize generation of microscratches during a polishing process. Therefore, the adjuvant for CMP slurry according to the present invention can improve reliability and productivity during the fabrication of very large scale integrated semiconductors.

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Daejeon, South Korea

Chang Bum Ko