Samsung Electronics Co., Ltd.

Chang-beom Kim

Tae-Joong Song

Ha-Young Kim

Dal-Hee Lee

Sung-We Cho

Hyun-jeong Roh

Jin-Tae Kim

An integrated circuit includes a first conductive pattern in a first conductive layer, a second conductive pattern in a second conductive layer over the first conductive layer, and a via electrically connected with the first conductive pattern and the second conductive pattern to allow a first current flowing from the first conductive pattern to the second conductive pattern and a second current flowing from the second conductive pattern to the first conductive pattern to pass through at different times. The via is placed on the first conductive pattern so that a path of the first current does not overlap with a path of the second current in the first conductive pattern.

Integrated circuit including interconnection and method of fabricating the same, the interconnection including a pattern shaped for mitigating electromigration

Integrated circuit including interconnection and method of fabricating the same, the interconnection including a pattern shaped and/or a via disposed for mitigating electromigration

A method of designing a layout of an integrated circuit (IC) includes: preparing a standard cell library that stores a first standard cell and a second standard cell, each of the first standard cell and the second standard cell including a plurality of conductive lines that extend in a first direction, placing the first standard cell and the second standard cell to be adjacent to each other in a first boundary parallel to the plurality of conductive lines, and generating a decoupling capacitor by using at least one first conductive line of the plurality of conductive lines when a same voltage is applied to a first pattern adjacent to the first boundary in the first standard cell and a second pattern adjacent to the first boundary in the second standard cell, the at least one first conductive line being adjacent to the first boundary.

Integrated circuit and method of designing layout of the same

Growing community of inventors

Tongyeong-si, South Korea

Chang-beom Kim