Mattson Technology, Inc

Other

Beijing E-town Semiconductor Technology, Co., Ltd

Chan-Yun Lee

Vijay Matthew Vaniapura

Li Diao

HaiAu PhanVu

James Paris

Robert George Elliston

David Gilbert

Tom Tillery

Gerald M Cox

John Kevin Donoghue

Kristel Van Baekel

A method for removing photoresist, an oxidation layer, or both from a semiconductor substrate is disclosed. The method includes placing a substrate in a processing chamber, the processing chamber separate from a plasma chamber for generating a non-oxidizing plasma to be used in treating the substrate; generating a first non-oxidizing plasma from a first reactant gas and a first carrier gas in the plasma chamber, wherein the first non-oxidizing plasma comprises from about 10% to about 40% of the first reactant gas, wherein the first reactant gas has a flow rate of from about 100 standard cubic centimeters per minute to about 15,000 standard cubic centimeters per minute, and wherein the first carrier gas has a flow rate of from about 500 standard cubic centimeters per minute to about 20,000 standard cubic centimeters per minute; and treating the substrate by exposing the substrate to the first non-oxidizing plasma in the processing chamber.

Method for high aspect ratio photoresist removal in pure reducing plasma

A method for removing organic and inorganic residues or polymers from the surface of semiconductor devices, with a combination of etchant gasses including water vapor generated using a catalytic moisture generator or CMG. The water vapor is generated by introducing O and an H containing forming gas including hydrogen and at least one dilutant gas into the CMG. The water vapor from the CMG is introduced into a reaction chamber with other etchant gasses to treat the surface of a semiconductor device placed within. The flow rate of water vapor out of the CMG and into the reaction chamber may be controlled by controlling the flow rate of the H containing forming gas and the flow rate of the O gas into the CMG.

Method for etching sidewall polymer and other residues from the surface of semiconductor devices

Growing community of inventors

Fremont, CA, United States of America

Chan-Yun Lee